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Shenzhen APG Material Company Limited

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China Titanium Boride TiB2 Ceramic Sputtering Target For PVD Coating
China Titanium Boride TiB2 Ceramic Sputtering Target For PVD Coating

  1. China Titanium Boride TiB2 Ceramic Sputtering Target For PVD Coating

Titanium Boride TiB2 Ceramic Sputtering Target For PVD Coating

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Packaging Details Vacuum-sealed packaging, case-packed for storage and transport
Delivery Time 4-5 weeks
Payment Terms T/T
Supply Ability Stable supply
Purity 99.99%
Relative Density 99%
Name Titanium Diboride Target (TiB₂)
Forming Process Sintering
Product Specifications Planar targets, Rotary targets, Custom-shaped Targets
Application Fields Display panel, Touchscreen technology,Photovoltaic industry,Flexible Electronics,Optical DeviceManufacturing
Brand Name APG
Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949

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  1. Product Details
  2. Company Details

Product Specification

Packaging Details Vacuum-sealed packaging, case-packed for storage and transport Delivery Time 4-5 weeks
Payment Terms T/T Supply Ability Stable supply
Purity 99.99% Relative Density 99%
Name Titanium Diboride Target (TiB₂) Forming Process Sintering
Product Specifications Planar targets, Rotary targets, Custom-shaped Targets Application Fields Display panel, Touchscreen technology,Photovoltaic industry,Flexible Electronics,Optical DeviceManufacturing
Brand Name APG Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949
High Light TiB2 Ceramic Sputtering TargetsTitanium Boride Ceramic Sputtering TargetsPVD Ceramic Sputtering Targets

Titanium diboride targets are ceramic targets manufactured from high-purity TiB₂ powders through hot pressing or sintering processes. They are functional materials with high melting points and high hardness. By combining the excellent chemical stability of metallic titanium with the high hardness, wear resistance, and corrosion resistance of borides,TiB₂ targets offer exceptional performance. These targets are widely used in various coating processes, including physical vapor deposition (PVD), magnetron sputtering, and chemical vapor deposition (CVD), enabling the deposition of high-performance ceramic thin films on diverse substrates.

Outstanding Properties of Titanium Diboride Targets

 

l Ultra-high Hardness and Wear Resistance

 

The deposited films can achieve a Vickers hardness exceeding 3000 HV, significantly enhancing surface scratch resistance and wear resistance.

 

 

l Excellent Corrosion and Oxidation Resistance

 

The films remain stable in acidic, alkaline, and high-temperature oxidative environments, resisting reaction and degradation, making them suitable for protective coatings under harsh operating conditions.

 

 

l Good Electrical and Thermal Conductivity

 

Unlike conventional ceramics, titanium diboride exhibits a notable level of electrical and thermal conductivity. This unique property makes it suitable for advanced functional coatings that require both exceptional hardness and conductive capabilities.

 

 

l Good adhesion and film density

 

Using high-purity TiB₂ targets enables the formation of dense, uniform films with strong adhesion, improving product consistency and reliability.

 

Wide Applications of Titanium Diboride Targets

 

l Display Panel

 

In the manufacturing of high-end displays such as LCDs, OLEDs, and Mini/Micro-LEDs, indium cerium oxide targets can be sputtered to form transparent conductive films with high transmittance and low resistivity for display panel electrodes and interconnections, significantly improving brightness uniformity, contrast, and service life.

 

l Touchscreen technology

 

In touch products such as smartphones, tablets, automotive displays, and industrial control panels, titanium diboride films can replace traditional ITO films as touch electrodes, delivering faster response, better transmittance, and improved flexibility compatibility, supporting narrow bezels and large-size touchscreen designs.

 

 

 l Photovoltaic industry

 

In high-efficiency solar cells such as HJT and perovskite tandem cells, they are used as transparent conductive electrode materials to reduce series resistance, improve photoelectric conversion efficiency, and enhance stability, providing higher-performance conductive solutions for next-generation photovoltaic modules.

 

 

l Flexible electronics

 

They can be sputtered onto flexible substrates such as polyimide (PI) and PET to form flexible transparent electrodes, applied in emerging products such as foldable displays, wearable devices, and flexible sensors.

 

 

l Optical device manufacturing

 

They are used for coating optical glass, optical film stacks, filters, and anti-reflection coatings, maintaining high transmittance while providing conductive or antistatic properties, suitable for precision optical fields such as optical communications and optical sensing.

 

 

Company Details

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Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people. APG specializes in the research and development (R&D) and production of PVD materials (sputtering targ... Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people. APG specializes in the research and development (R&D) and production of PVD materials (sputtering targ...

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  • Shenzhen APG Material Company Limited
  • HQ Add:Rooms 1401,Bldg.2,Runzhi R&D Center,CRB Tech-Innovative City, Xinan Street,Bao'an District,Shenzhen,China
  • https://www.apgsputtertarget.com/

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