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Shenzhen APG Material Company Limited

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China SiC Silicon Carbide Sputtering Target High Temperature Corrosion Resistance
China SiC Silicon Carbide Sputtering Target High Temperature Corrosion Resistance

  1. China SiC Silicon Carbide Sputtering Target High Temperature Corrosion Resistance

SiC Silicon Carbide Sputtering Target High Temperature Corrosion Resistance

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Packaging Details Vacuum-sealed packaging, case-packed for storage and transport
Delivery Time 4-5 weeks
Payment Terms T/T
Supply Ability Stable supply
Purity 99.9%-99.999%
Density 3.21 g/cm³‌
Name Silicon Carbide Target (SiC)
Forming Process Sintering
Product Specifications Planar targets, Rotary Targets, Custom-shaped Targets
Application Fields Semiconductor Manufacturing, Display Panels,Photovoltaic Industry, Optical DeviceManufacturing,Decorative Coatings
Brand Name APG
Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949

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  1. Product Details
  2. Company Details

Product Specification

Packaging Details Vacuum-sealed packaging, case-packed for storage and transport Delivery Time 4-5 weeks
Payment Terms T/T Supply Ability Stable supply
Purity 99.9%-99.999% Density 3.21 g/cm³‌
Name Silicon Carbide Target (SiC) Forming Process Sintering
Product Specifications Planar targets, Rotary Targets, Custom-shaped Targets Application Fields Semiconductor Manufacturing, Display Panels,Photovoltaic Industry, Optical DeviceManufacturing,Decorative Coatings
Brand Name APG Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949
High Light Silicon Carbide Sputtering TargetSiC Silicon Carbide Sputtering TargetSiC Target Corrosion Resistance

Silicon carbide (SiC) targets are manufactured from high-purity powders, offering excellent resistance to high temperatures and corrosion, alongside superior chemical stability and thermal conductivity. These properties make them especially suitable for depositing high-performance thin films under harsh operating conditions. They are vital functional materials widely used across the semiconductor, photovoltaic, and optical industries.

Key Advantages of Silicon Carbide Targets

 

l High Purity, Cleaner Films

 

Silicon carbide targets use high-purity SiC raw materials with metal impurity content below 100 ppm. The deposited films have fewer defects and contaminations, with stable electrical and optical properties, making them suitable for high-end electronic devices.

 

 

l Ultra-high hardness and wear resistance

 

The target is resistant to peeling and cracking under high-power sputtering conditions, extending target lifetime by more than 30% as compared with conventional ceramic targets. This reduces particle contamination and improves production yield.

 

 

l Excellent Thermal Conductivity and Thermal Shock Resistance

 

It enables rapid heat dissipation and allows higher power-density sputtering. The target is resistant to cracking caused by thermal shock, making it suitable for long-term continuous deposition.

 

 

l Dense and uniform structure, consistent film quality

 

Silicon carbide targets feature a high density and uniform particle distribution, enabling high deposition rates and excellent film thickness uniformity. Stable quality can be maintained even for large-size targets.

 

 Main Application Areas of Silicon Carbide Targets

 

l  Semiconductor Manufacturing

 

Used for thin film deposition in power devices, RF devices, and MEMS sensors. Dense and highly insulating films are formed via magnetron sputtering and related processes, improving device breakdown voltage, temperature resistance, and stability.

 

 

l Display Panels

 

Silicon carbide (SiC) targets are utilized as robust hard protective layers or buffer layers in modern displays, including LCD, OLED, Micro-LED, and flexible technologies. These layers enhance scratch resistance and chemical stability while ensuring crucial optical transmittance and maintaining touch sensitivity

 

 

l Photovoltaic Industry

 

SiC is utilized as anti-reflection layers, protective films, or buffer layers in both crystalline silicon and thin-film solar cells. These applications improve light absorption efficiency, significantly reduce reflection losses, and enhance the long-term stability and overall durability of the devices.

 

 

l Optical Device Manufacturing

 

SiC is used for coating lenses, filters, prisms, and other optical components. Film refractive index and transmittance can be controlled to achieve anti-reflection, filtering, or high-reflection functions, suitable for laser optics and aerospace applications.

 

 

l Decorative Coatings

 

Forms high-hardness, wear-resistant coatings on the surfaces of mobile phones, watches, automotive interiors, and precision components. This application provides an attractive metallic appearance while extending product service life.

 

 

Company Details

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Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people. APG specializes in the research and development (R&D) and production of PVD materials (sputtering targ... Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people. APG specializes in the research and development (R&D) and production of PVD materials (sputtering targ...

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  • Shenzhen APG Material Company Limited
  • HQ Add:Rooms 1401,Bldg.2,Runzhi R&D Center,CRB Tech-Innovative City, Xinan Street,Bao'an District,Shenzhen,China
  • https://www.apgsputtertarget.com/

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