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Shenzhen APG Material Company Limited

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China High Purity Tantalum Pentoxide Ta2O5 For Optical Device Semiconductor
China High Purity Tantalum Pentoxide Ta2O5 For Optical Device Semiconductor

  1. China High Purity Tantalum Pentoxide Ta2O5 For Optical Device Semiconductor

High Purity Tantalum Pentoxide Ta2O5 For Optical Device Semiconductor

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Packaging Details Vacuum-sealed packaging, case-packed for storage and transport
Delivery Time 4-5 weeks
Payment Terms T/T
Supply Ability Stable supply
Refractive index 2-2.25(500nm)
Transparent band 350-9000nm
Name Tantalum Pentoxide (Ta₂O₅)
Forming Process Powder Metallurgy, Hot Pressing Sintering
Product Specifications Evaporation Particles
Application Fields Optical Device Manufacturing,Photovoltaic Industry, Semiconductor Manufacturing
Brand Name APG
Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949

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  1. Product Details
  2. Company Details

Product Specification

Packaging Details Vacuum-sealed packaging, case-packed for storage and transport Delivery Time 4-5 weeks
Payment Terms T/T Supply Ability Stable supply
Refractive index 2-2.25(500nm) Transparent band 350-9000nm
Name Tantalum Pentoxide (Ta₂O₅) Forming Process Powder Metallurgy, Hot Pressing Sintering
Product Specifications Evaporation Particles Application Fields Optical Device Manufacturing,Photovoltaic Industry, Semiconductor Manufacturing
Brand Name APG Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949
High Light High Purity Tantalum Pentoxide Tantalum Pentoxide Ta2O5 Semiconductor Tantalum Pentoxide

Tantalum pentoxide (Ta₂O₅) is an important functional inorganic oxide, characterized by a high dielectric constant, high refractive index, and excellent chemical stability. It is an insulator at room temperature, with a band gap of approximately 4.0–4.5 eV, and can form high-quality thin films through processes like vacuum evaporation or magnetron sputtering. Ta₂O₅ films exhibit high transparency, low absorption, and maintain stable physical and chemical properties over time, making it a key material in optical and electronic thin film manufacturing.

Outstanding Characteristics of Tantalum Pentoxide (Ta₂O₅)

 

l High Dielectric Performance


It has a dielectric constant (20 to 25) significantly higher than that of silica  which makes it suitable as a dielectric material for capacitors and high-k films.

 

l Excellent Optical Properties


It exhibits a refractive index of approximately 2.0–2.25 (at 500 nm), which is highly tunable via deposition process optimization. Coupled with superior optical transmittance, this characteristic makes it ideal for high-performance interference coatings and advanced optical systems.

 

 

l Thermal and Chemical Stability


It has exceptional thermal and chemical resilience, maintaining superior thin-film stability even when subjected to extreme temperatures and corrosive environments.

 

 

l Low Absorption Loss

Low absorption and scattering properties of the films leads to high efficiency and long lifespan for optical devices.

 

 

l High Purity


High-purity raw materials ensures a low-defect morphology during deposition. This optimization is critical for achieving the stringent performance uniformity and device stability required for next-generation electronic architectures.

 

Wide Applications of Tantalum Pentoxide (Ta₂O₅)

 

l Optical Device Manufacturing


It is used in the preparation of anti-reflection coatings (AR coatings), optical filters, high refractive index layers, and multilayer interference films.

 

 It plays a significant role in advanced optical systems by providing a high refractive index and excellent transparency, making it a critical material for high-performance interference filters, anti-reflective coatings, and optical waveguides in lenses, projectors, and laser systems..

 

 

l Photovoltaic Industry


It is used in anti-reflection coatings for solar cells to improve light absorption and energy conversion efficiency.


It enhances the stability and weather resistance of thin-film solar modules.

 

 

l Semiconductor Manufacturing


It is widely used in dielectric layers for DRAM, flash memory, and capacitors.

 

 

l As a high-k dielectric film in the semiconductor industry, it meets the demands for chip miniaturization and high performance.

 

 

Company Details

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Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people. APG specializes in the research and development (R&D) and production of PVD materials (sputtering targ... Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people. APG specializes in the research and development (R&D) and production of PVD materials (sputtering targ...

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  • Shenzhen APG Material Company Limited
  • HQ Add:Rooms 1401,Bldg.2,Runzhi R&D Center,CRB Tech-Innovative City, Xinan Street,Bao'an District,Shenzhen,China
  • https://www.apgsputtertarget.com/

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