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Baolishi Grinding Technology (Changzhou) Co., Ltd.

  • China,Changzhou ,Jiangsu
  • Verified Supplier
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China Conditioned Fabric Pad (Black) - Final CMP Polishing Step | POLISHER
China Conditioned Fabric Pad (Black) - Final CMP Polishing Step | POLISHER

  1. China Conditioned Fabric Pad (Black) - Final CMP Polishing Step | POLISHER

Conditioned Fabric Pad (Black) - Final CMP Polishing Step | POLISHER

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Washable Yes
Color Black
Reusable Yes
Material Fabric
origin China
Productname Polishing Pad
Certification ISO 9001 Quality Management System, ISO 14001 Environmental Management System, ISO 45001 Occupational Health and Safety
Place of Origin China
Brand Name POLISHER

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  1. Product Details
  2. Company Details

Product Specification

Washable Yes Color Black
Reusable Yes Material Fabric
origin China Productname Polishing Pad
Certification ISO 9001 Quality Management System, ISO 14001 Environmental Management System, ISO 45001 Occupational Health and Safety Place of Origin China
Brand Name POLISHER

Conditioned Fabric Pad (Black) – The Final Step to Flawless Surfaces

CMP Damped Fabric Polishing Pad — For Ultimate Surface Perfection

POLISHER Conditioned Fabric Pad (Black) is a key consumable in Chemical Mechanical Planarization (CMP) for precision materials such as semiconductor chips and optical glass, delivering the final step toward flawless, defect-free surfaces.

Key Features:

  • Dual-Action Planarization – Achieves planarization by combining physical friction with chemical action for superior surface refinement
  • Polyurethane Construction – Typically constructed from durable polymer materials for consistent, dependable final-stage performance
  • Precision Performance Control – Key parameters including hardness, density, pore size, and elasticity directly control polishing results and removal rate
  • Final-Stage Finishing – Positioned as the last step in the CMP process chain, delivering ultimate surface perfection
  • Precision Material Compatibility – Engineered specifically for demanding materials like semiconductor chips and optical glass

Role in CMP Process:
Serves as the final conditioning stage in CMP processing, following coarse polyurethane and mid-stage non-woven pads to deliver a flawless, damage-free finish.

Applications:
Ideal for semiconductor chip and optical glass finishing — the final step for applications requiring ultimate surface perfection and precision planarization.

Certifications: Manufactured under ISO9001 Quality Management System certification.

Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

 and 

Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer,Exporter

  • Year Established:

    2013

  • Total Annual:

    20000000-30000000

  • Employee Number:

    40~50

  • Ecer Certification:

    Verified Supplier

Burnish Abrasives Technology Co., Ltd. Headquartered in Shanghai with a state-of-the-art production facility in Changzhou, Jiangsu Province, Burnish Abrasives is an innovation-driven enterprise specializing in the R&D, manufacturing, and global distribution of advanced surface treatment consumab... Burnish Abrasives Technology Co., Ltd. Headquartered in Shanghai with a state-of-the-art production facility in Changzhou, Jiangsu Province, Burnish Abrasives is an innovation-driven enterprise specializing in the R&D, manufacturing, and global distribution of advanced surface treatment consumab...

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  • Baolishi Grinding Technology (Changzhou) Co., Ltd.
  • Qianling Road, Zhaiqiao Industrial Park, Wujin District, Changzhou City, Jiangsu Province,China
  • https://www.baolishipolisher.com/

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