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{"title":"MgAl2O4 Magnesium Aluminate","imgUrl":"https:\/\/img.chinax.com\/nimg\/17\/e7\/e2f979bf48716928ba9c51bc91db-200x200-1\/mgal2o4_magnesium_aluminate.jpg","attrs":{"Brand Name":"Crystro","Model Number":"CR20200309-1","Certification":"SGS","Place of Origin":"China"}}
{"title":"Co2+:MgAl2O4 Single Crystal Substrate","imgUrl":"https:\/\/img.chinax.com\/nimg\/06\/83\/a37ccd717e78f72b4a4b965e1b00-200x200-1\/co2_2b_3amgal2o4_single_crystal_substrate.jpg","attrs":{"Brand Name":"Crystro","Model Number":"CR20200309-2","Certification":"SGS","Place of Origin":"China"}}
{"title":"6.74 G\/Cm3 Double Side Polished LSAT Optical Substrate","imgUrl":"https:\/\/img.chinax.com\/nimg\/a5\/b0\/376c42d82b6fa557eb13b5399a1c-200x200-1\/6_74_g_2fcm3_double_side_polished_lsat_optical_substrate.jpg","attrs":{"Brand Name":"Crystro","Model Number":"CR20200309-3","Certification":"SGS","Place of Origin":"China"}}
{"title":"LSAT Single Crystal Substrate","imgUrl":"https:\/\/img.chinax.com\/nimg\/d4\/53\/79701a59ca9a9ba2f3bc428cf11b-200x200-1\/lsat_single_crystal_substrate.jpg","attrs":{"Brand Name":"Crystro","Model Number":"CR20200309-3","Certification":"SGS","Place of Origin":"China"}}
4-inch SGGG Large-Size Substrate, Gadolinium Gallium Garnet Single Crystal, (111) EPI-Grade Polished, Faraday Rotator for 1.6T/CPO Optical Modules, High-Capacity Magneto-Optical Film Epitaxy
The 4-inch SGGG large-size substrate is a high-end specification for next-generation high-speed optical communications (1.6T/CPO) and large-scale production lines. With a diameter of 101.6 mm and standard thickness of 800 ± 30 μm (or custom), it is based on large-size single crystal growth technology. Full-wafer lattice constant uniformity ≤ 0.003 Å, dislocation density ≤ 10 cm⁻², and effective area ≥ 80%. Rotator chip output per wafer increases approximately 75% compared to 3-inch, significantly reducing per-chip cost.
Large-size SGGG crystal growth is technically demanding, requiring strict thermal field control, raw material purity, and annealing processes. Through optimized Czochralski growth and multi-step annealing, this product achieves low-stress, low-absorption, high-uniformity crystal quality. Combined with primary/secondary flats and EPI-grade super-smooth polishing, it meets the large-size mass production requirements of high-end magneto-optical film epitaxy equipment.
Key Functions
High-capacity substrate for 1.6T/CPO era:
4-inch large size adapts to next-gen high-speed module rotator mass production, more chips per wafer
Lower per-chip cost:
~75% larger effective area than 3-inch, dilutes epitaxy, dicing, and inspection costs
High-end magneto-optical film epitaxy:
High lattice uniformity ensures large-area BIG film thickness and magneto-optical performance consistency
Anhui Crystro Crystal Materials Co., Ltd. is specialized in research and development of crystal science and technology,we located at Anhui Province,Hefei City.
Our business scope mainly concentrated in high-tech crystal materials research and development, manufacture and m... Anhui Crystro Crystal Materials Co., Ltd. is specialized in research and development of crystal science and technology,we located at Anhui Province,Hefei City.
Our business scope mainly concentrated in high-tech crystal materials research and development, manufacture and m...
