​​Customized Quartz Bell Jars with Coating Options for Semiconductor Plasma

Below is an overview of the core parameters of quartz bell jars in semiconductor plasma generators, highlighting key specifications:

The role of the quartz bell jar in a semiconductor plasma generator can be understood as ​​"creating and guarding the ideal space for plasma reactions"​​.

• ​​Establishing a Sealed Environment:​​ The quartz bell jar, combined with components like a metal base plate via seals (e.g., O-rings), forms a ​​sealed reaction chamber. Before the process begins, the vacuum system evacuates the interior of the bell jar to a high vacuum (e.g., on the order of 10⁻⁶ to 10⁻⁹ Torr), completely removing impurities like moisture and oxygen from the air, providing a pure "stage" for the plasma reaction.

• ​​Injection and Excitation:​​ High-purity process gases (e.g., CF₄ for etching, SiH₄ for deposition, or auxiliary gas Ar) are precisely controlled and injected into the bell jar. Subsequently, energy sources such as microwave or radio frequency excite these gases, ionizing them to form ​​plasma​​, which contains highly active ions, electrons, and radicals.

• ​​Sustaining the Reaction:​​ During the reaction, the ​​high chemical stability and low outgassing​​ of the quartz bell jar are crucial. It effectively resists corrosion and erosion of the chamber walls by the plasma, preventing the bell jar itself from becoming a source of contamination, thereby ensuring process consistency and wafer product purity.

Primary Application Areas​​ of Quartz Bell Jars

Based on the above properties, quartz bell jars are primarily used in the following key semiconductor manufacturing processes:

• ​​Plasma Enhanced Chemical Vapor Deposition (PECVD):​​ In PECVD processes, the quartz bell jar provides a stable reaction environment for depositing films like silicon nitride and silicon dioxide. Its high purity and temperature resistance ensure the quality of the deposited films.

• ​Dry Etching:​​ In etching processes, the quartz bell jar can withstand highly corrosive fluorine-based, chlorine-based plasmas, protecting other components of the reaction chamber and maintaining the uniformity and repeatability of the etching process.
• ​Microwave Plasma Chemical Vapor Deposition (MPCVD):​​ In advanced processes like MPCVD for producing large-size, high-quality diamond films (used in semiconductor heat dissipation, etc.), the quartz bell jar is a key component due to its ability to create a pure plasma environment.

About ZMSH

ZMSH specializes in providing high-performance material solutions for the semiconductor, optoelectronics, and high-end manufacturing sectors. With mature capabilities in customizing key components for plasma process equipment—such as quartz bell jars—ZMSH employs high-purity quartz materials tailored to client requirements for sealing, temperature resistance, and plasma corrosion resistance. The company precisely controls dimensions, flange interfaces, and optical transmittance to ensure stable performance in etching, CVD, and other processes.

Additionally, ZMSH supplies a range of customized products including sapphire optical windows and substrates, silicon carbide (SiC) power device substrates, silicon wafers, quartz custom components, and SOI wafers. These offerings cover full-chain services from material preparation to precision processing (e.g., cutting, grinding, polishing), meeting stringent demands for high hardness, thermal conductivity, and insulation in industries such as consumer electronics, aerospace, and medical devices.

By integrating material R&D with a flexible manufacturing system, ZMSH enables rapid prototyping and batch delivery of non-standard products, supporting technological innovation and product upgrades for clients.