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Shaanxi KeGu New Material Technology Co., Ltd

  • China,Tongchuan ,Shaanxi
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China Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High
China Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High

  1. China Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High
  2. China Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High
  3. China Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High

Silicon Carbide Tray & SiC Wafer Holder with 1650°C Max Service Temp, High

  1. MOQ: Negotiable
  2. Price: Negotiable
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Material Silicon Carbide Ceramic
Composition:SiC >98%
Color Black
Density >3.05g/cm3
Max. Service Temp 1650°C
Flexural Strength 350-550 MPa
Payment Terms L/C,D/A,D/P,T/T,,
Packaging Details Strong wooden box for Global shipping
Delivery Time Negotiable
Usage Industry Usage
Chemical Composition Al2O3, SiO2
Sic Content 85%
Maximum Temperature 1600℃
Characteristics High wear resistance
Thermal Expansion Coefficient 4.0-4.5 × 10^-6 /K
Material Composition 4%Si >96%Sic
Working Temperature 1650
Advantage Wear and abrasion resistance
Purity 98%
Acid Alkaline Proof excellent
Solubility Insoluble
Open Porosity <0.1%
Model Number Customizable
Brand Name KEGU
Place of Origin China

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  1. Product Details
  2. Company Details

Product Specification

Material Silicon Carbide Ceramic Composition:SiC >98%
Color Black Density >3.05g/cm3
Max. Service Temp 1650°C Flexural Strength 350-550 MPa
Payment Terms L/C,D/A,D/P,T/T,, Packaging Details Strong wooden box for Global shipping
Delivery Time Negotiable Usage Industry Usage
Chemical Composition Al2O3, SiO2 Sic Content 85%
Maximum Temperature 1600℃ Characteristics High wear resistance
Thermal Expansion Coefficient 4.0-4.5 × 10^-6 /K Material Composition 4%Si >96%Sic
Working Temperature 1650 Advantage Wear and abrasion resistance
Purity 98% Acid Alkaline Proof excellent
Solubility Insoluble Open Porosity <0.1%
Model Number Customizable Brand Name KEGU
Place of Origin China
High Light Icp Etching Wafer Holder Sic PlateWafer Holder Silicon Carbide PlateLed Industry Sic Plate
Silicon Carbide (SiC) Trays & Plates: High-Performance Wafer Holders for ICP Etching in LED Manufacturing
Silicon Carbide (SiC) trays and plates are precision-engineered wafer carriers designed specifically for Inductively Coupled Plasma (ICP) etching processes within the LED industry. SiC stands out as a superior material due to its exceptional thermal management, outstanding corrosion resistance, and remarkable mechanical stability at extreme temperatures.
Key Material Advantages
  • Superior Thermal Conductivity: For efficient heat dissipation and uniform temperature distribution across the wafer
  • Exceptional Plasma & Corrosion Resistance: Withstands harsh chemical environments and plasma shock for extended service life
  • High Mechanical Strength at Elevated Temperatures: Maintains structural integrity and dimensional stability under high thermal loads
  • Low Thermal Expansion: Minimizes the risk of warping or stress on wafers during thermal cycling
Silicon Carbide (SiC) Material Properties
Property Value
Compound Formula SiC
Molecular Weight 40.1
Appearance Black
Melting Point 2,730 °C (decomposes)
Density 3.0 - 3.2 g/cm³
Electrical Resistivity 1 - 4 x 10¹ Ω*m
Poisson's Ratio 0.15 - 0.21
Specific Heat 670 - 1180 J/kg*K
Comparative Specifications: SiC Tray Types
Type Recrystallized SiC Sintered SiC Reaction Bonded SiC
Purity > 99.5% > 98% > 88%
Max. Working Temp. 1650 °C 1550 °C 1300 °C
Bulk Density (g/cm³) 2.7 3.1 > 3.0
Apparent Porosity < 15% < 2.5% < 0.1%
Flexural Strength (MPa) 110 400 380
Compressive Strength (MPa) > 300 2200 2100
Thermal Expansion (10⁻⁶/°C) 4.6 (at 1200°C) 4.0 (at <500°C) 4.4 (at <500°C)
Thermal Conductivity (W/m*K) 35 - 36 110 65
Primary Characteristics High-Temperature Resistance, High Purity High Fracture Toughness Excellent Chemical Resistance
Critical Features for ICP Etching
  • Excellent Thermal Conductivity: Ensures rapid heat transfer and minimizes thermal gradients
  • Superior Resistance to Plasma Shock: Guarantees long-term durability and process consistency
  • Excellent Temperature Uniformity: Critical for achieving uniform etch rates and high device performance across the entire wafer
Primary Applications
  • Semiconductor Processing: Ideal as wafer carriers, susceptors, and process fixtures in CVD, MOCVD, and epitaxy
  • LED Manufacturing: Widely used as robust and reliable wafer holders for ICP etching processes in the production of Light-Emitting Diodes
  • Advanced Coatings & Components: Suitable for various industrial applications requiring high thermal and chemical stability
We supply a comprehensive range of standard and custom-sized Silicon Carbide trays, plates, and other specialized SiC components to meet the precise needs of the semiconductor and LED industries.

Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

 and 

Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer,Trading Company

  • Year Established:

    2017

  • Ecer Certification:

    Verified Supplier

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  • Shaanxi KeGu New Material Technology Co., Ltd
  • No. 2 Workshop, Zone B, Dongyuan Ceramic Industrial Park, Wangyi District, Tongchuan, Shaanxi 727000, China
  • https://www.hitech-ceram.com/

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