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HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD

  • China,Zhengzhou ,Henan
  • Verified Supplier
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China Ceramic Electrostatic Chuck (ESC) —— Precision Substrate Clamping for High
China Ceramic Electrostatic Chuck (ESC) —— Precision Substrate Clamping for High

  1. China Ceramic Electrostatic Chuck (ESC) —— Precision Substrate Clamping for High
  2. China Ceramic Electrostatic Chuck (ESC) —— Precision Substrate Clamping for High
  3. China Ceramic Electrostatic Chuck (ESC) —— Precision Substrate Clamping for High

Ceramic Electrostatic Chuck (ESC) —— Precision Substrate Clamping for High

  1. MOQ: 1 PC
  2. Price: 10USD/PC
  3. Get Latest Price
Delivery Time 5-8 work days
Payment Terms L/C, D/A, D/P, T/T, Western Union, MoneyGram
Supply Ability 1000 PCS
Packaging Details Strong wooden box for Global shipping
Model Number MS
Certification CE
Place of Origin China
Brand Name ZG

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  1. Product Details
  2. Company Details

Product Specification

Delivery Time 5-8 work days Payment Terms L/C, D/A, D/P, T/T, Western Union, MoneyGram
Supply Ability 1000 PCS Packaging Details Strong wooden box for Global shipping
Model Number MS Certification CE
Place of Origin China Brand Name ZG
High Light ceramic electrostatic chuck for high-vacuumprecision substrate clamping ESCceramic ESC for plasma environments

Ceramic Electrostatic Chuck (ESC) —— Precision Substrate Clamping for High-Vacuum & Plasma Environments

 

In advanced semiconductor fabrication and thin-film deposition, conventional mechanical or vacuum clamping methods fail to meet the ultra-clean, high-vacuum, and temperature-controlled requirements of sub-nanometer processing. Our Ceramic Electrostatic Chucks (ESC) utilize Coulombic or Johnsen-Rahbek (J-R) electrostatic forces to securely clamp wafers and substrates without mechanical edge contact, delivering exceptional temperature uniformity, wafer flatness, and particle reduction.

Technical Mechanisms & Types

We engineer both primary electrostatic chuck configurations tailored to specific processing environments:

  • Johnsen-Rahbek (J-R) Type Ceramic ESC: Manufactured using semi-conductive ceramic formulations (such as doped Alumina or Silicon Carbide). Utilizing micro-leakage currents at the wafer-chuck interface, J-R chucks generate immense electrostatic clamping forces at lower operating voltages, making them ideal for high-density plasma etching and PVD/CVD processes.

  • Coulombic Type Ceramic ESC: Constructed with high-purity insulating ceramics. Clamping relies entirely on pure electrostatic charge accumulation, providing stable clamping across broad temperature ranges and ultra-fast de-chucking capabilities for sensitive dielectric materials.

Key Advantages

1. Exceptional Thermal Control & Uniformity

Integrated with multi-zone resistive heating elements and embedded helium cooling channels, our ceramic ESCs ensure precise wafer temperature distribution ($le pm 1^circtext{C}$ across $300 text{mm}$ wafers), critical for critical dimension (CD) control in etching and deposition.

2. High Corrosion & Plasma Resistance

Engineered from advanced technical ceramics such as High-Purity Alumina ($Al_2O_3$) and Aluminum Nitride ($AlN$), the chuck surface resists aggressive halogen plasmas ($F_2$, $Cl_2$) and reactive gases, minimizing chamber particle generation and extending operational lifespan.

3. Ultra-Flat Surface & Particle Suppression

Micro-machined mesa (pin) patterns on the ceramic surface drastically reduce the contact area between the wafer backside and the chuck, preventing backside particle contamination and maintaining superior wafer flatness ($le 1 mutext{m}$).

4. Fast Response & Reliable De-Chucking

Optimized dielectric layers and advanced power control allow for rapid chucking and de-chucking cycles, eliminating residual electrostatic charge and maximizing wafer throughput.

Typical Applications

Semiconductor Process Key ESC Functions
Plasma Etching (RIE / ICP / ALE) High thermal conductivity, plasma erosion resistance, multi-zone temp control
Thin Film Deposition (PVD / PECVD / ALD) High-temperature structural integrity, uniform wafer heating, high-vacuum compatibility
Ion Implantation Reliable electrostatic clamping under high beam currents and heat loads
Wafer Inspection & Metrology Non-contact edge clamping, ultra-high planarity, non-magnetic operation

Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

 and 

Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer,Distributor/Wholesaler,Importer,Exporter

  • Year Established:

    2007

  • Total Annual:

    5000000-8000000

  • Employee Number:

    50~100

  • Ecer Certification:

    Verified Supplier

Henan ZG Industrial Products Co. Ltd. was founded by specialists of leading industrial institutes in Zhengzhou city, China in 2007.Our company manufactures, complex develops, supplies, introduces and upgrades products from technical ceramics, heating elements and graphite. We provide services f... Henan ZG Industrial Products Co. Ltd. was founded by specialists of leading industrial institutes in Zhengzhou city, China in 2007.Our company manufactures, complex develops, supplies, introduces and upgrades products from technical ceramics, heating elements and graphite. We provide services f...

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  • HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD
  • No. 26, Dongqing Street, High-tech Zone, Zhengzhou ,Henan, China
  • https://www.industrial-ceramicparts.com/

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