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High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
Brief Introduction
The LR-CK107 is a high-vacuum multi-arc ion coating system designed for the preparation of multi-component amorphous alloys, metal compounds (such as oxide and nitride thin films in oxygen or nitrogen atmospheres), nanoparticle catalyst films, and thermoelectric thin films using thermoelectric material targets.
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
Detailed Introduction
The LR-CK107 utilizes arc discharge to ionize conductive materials. Leveraging the excellent diffraction characteristics of the process, it generates high-energy ions that are deposited onto substrates—particularly porous ones like nickel foam—to create nanoscale coatings or nanoparticles. The system comprises a coating chamber, multi-arc targets, a multi-arc power supply, a pulsed bias power supply, a sample stage, heating elements, a vacuum system, a gas delivery system, and a semi-automatic control system (PLC + touchscreen). It features an integrated design combining the main unit and control system for ease of operation, as well as a compact structure with a small footprint. This series of equipment is widely used in universities and research institutes for teaching and experimental research, as well as by manufacturing enterprises for preliminary exploratory experiments and new product development, earning high praise from users.
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
Brief Introduction
The LR-CK107 is a high-vacuum multi-arc ion coating system designed for the preparation of multi-component amorphous alloys, metal compounds (such as oxide and nitride thin films in oxygen or nitrogen atmospheres), nanoparticle catalyst films, and thermoelectric thin films using thermoelectric material targets.
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
Detailed Introduction
The LR-CK107 utilizes arc discharge to ionize conductive materials. Leveraging the excellent diffraction characteristics of the process, it generates high-energy ions that are deposited onto substrates—particularly porous ones like nickel foam—to create nanoscale coatings or nanoparticles. The system comprises a coating chamber, multi-arc targets, a multi-arc power supply, a pulsed bias power supply, a sample stage, heating elements, a vacuum system, a gas delivery system, and a semi-automatic control system (PLC + touchscreen). It features an integrated design combining the main unit and control system for ease of operation, as well as a compact structure with a small footprint. This series of equipment is widely used in universities and research institutes for teaching and experimental research, as well as by manufacturing enterprises for preliminary exploratory experiments and new product development; it is highly acclaimed by users.
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
High-Vacuum Multi-Arc Ion Coating System Ionic Thin Film Coater Ionized Plating Layer Tester Cathodic Arc Deposition Device
Specification
Technical Specifications
Item
Specification
1. Vacuum chamber
Ф500×H420mm, 304 stainless steel, front door opening structure; Chamber heating temperature: room temperature ~ 350±1℃;
2. Vacuum system
A high vacuum system composed of a composite molecular pump + direct-coupled rotary vane pump + high vacuum valve, and a digital display composite vacuum gauge;
3. Vacuum limit
Better than 6.0×10-5Pa (no load, after baking and degassing);
4. Leak rate
Equipment pressure boost rate ≤0.8Pa/h;Equipment pressure maintenance: 12 hours after stopping the pump, the vacuum is ≤10Pa;
5. Pumping speed
(No load) Pumped from the atmosphere to 5.0×10-3Pa≤15min;
6. Substrate table size
Φ150mm, 3 rotation stations;
7. Substrate stage rotation
Substrate rotation: 0~20 rpm;
8. Sputtering target
DN100 new magnetic filter multi-arc target 2 sets
9. Pulse bias power supply
-1000V, 1 set;
11. Control method
PLC+touch screen human-machine interface semi-automatic control system;
12. Alarm and protection
Alarm and implement corresponding protection measures for abnormal conditions such as water shortage, overcurrent and overvoltage, circuit breakage, etc. in pumps and electrodes; complete logic program interlock protection system;
13. Land occupation
(Host) L1900×W800×H1900(mm).
Our Advantages
Company Details
Bronze Gleitlager
,
Bronze Sleeve Bushings
and
Graphite Plugged Bushings
from Quality China Factory
Business Type:
Manufacturer,Agent,Exporter,Seller
Year Established:
2008
Total Annual:
$5 million -$8 million
Employee Number:
80~200
Ecer Certification：
Verified Supplier
Dongguan Lonroy Equipment Co., Ltd, located in Dongguan, Guangdong, is a leading company specializing in the research and development, manufacturing and sales of high-tech and high-precision testing equipment. With 20 years of industry experience, we are committed to providing excellent tes...
Dongguan Lonroy Equipment Co., Ltd, located in Dongguan, Guangdong, is a leading company specializing in the research and development, manufacturing and sales of high-tech and high-precision testing equipment. With 20 years of industry experience, we are committed to providing excellent tes...
