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Four-Target Magnetron Sputtering Coater with Load-Lock Chamber PVD Thin Film Coating Instrument Alloy Membranes Sputter Tester
Brief Introduction
The four-target magnetron sputtering coating system is designed for the deposition of various thin films, including ferroelectric, conductive, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, and PTFE films.
Four-Target Magnetron Sputtering Coater with Load-Lock Chamber PVD Thin Film Coating Instrument Alloy Membranes Sputter Tester
Detailed Introduction
This four-target magnetron sputtering coating system is a cost-effective unit independently developed by our company, featuring a standardized, modular, and customizable design. Customers can select magnetron targets in sizes ranging from 1 to 4 inches based on their substrate dimensions. The system is equipped with 500W DC and 500W RF power supplies; the DC supply is suitable for metal films, while the RF supply handles non-metallic films. The four-target configuration supports multi-layer or sequential coating processes. Custom RF and pulsed power supplies are available upon request, with various specifications ranging from 300W to 1000W.
The equipment consists of a main chamber and a load-lock chamber (transition chamber). The load-lock chamber features a magnetic transfer rod, and a vacuum gate valve separates the two chambers. This design allows users to load samples and perform pre-vacuuming in the load-lock chamber while sputtering takes place in the main chamber. Once the main process is complete, the sample can be transferred onto the main chamber's stage using the magnetic rod. This setup minimizes the frequency of main-chamber vacuum cycling, thereby saving time, maintaining a superior vacuum environment, and effectively enhancing coating quality.
The four-target magnetron sputtering coating system is suitable for depositing single or multi-layer films such as ferroelectric, conductive, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, and PTFE films. Compared to similar equipment, this four-target magnetron sputtering system offers not only broad applicability but also the advantages of a compact size and ease of operation, making it an ideal tool for laboratory thin-film fabrication. The entire deposition process takes place in a high-vacuum environment, ensuring that evaporated atoms or molecules reach the substrate directly; this prevents contamination by atmospheric impurities and enhances film quality. High-vacuum conditions also help minimize the oxidation of the source material, further improving the purity and performance of the resulting thin film.
Four-Target Magnetron Sputtering Coater with Load-Lock Chamber PVD Thin Film Coating Instrument Alloy Membranes Sputter Tester
Four-Target Magnetron Sputtering Coater with Load-Lock Chamber PVD Thin Film Coating Instrument Alloy Membranes Sputter Tester
Specification
Technical Specifications
Category
Item
Specification
Product Name
Four-Target Magnetron Sputtering Coater (DC Power + RF Power)
Product Model
LR-CK101
Sample Stage
Dimensions
φ150 mm
Temperature Control Accuracy
±1°C
Heating Range
Room temperature to 900°C
Adjustable Rotation Speed
1–20 rpm (adjustable)
Magnetron Target Guns
Sputtering Direction
Downward sputtering
Tilting Target Angle Range
-45° to +45°; equipped with pneumatic shutter
Target Material Dimensions
4-inch diameter, thickness ≤3 mm
Insulation Voltage
>2000 V
Quantity
Three 4-inch tilting targets; one 4-inch fixed target
Cooling Method
Water cooling
Vacuum Chamber
Chamber Type
D-type chamber
Chamber Dimensions
Φ500 mm × 500 mm
Chamber Material
304 Stainless steel
Observation Window
Quartz window, φ100 mm diameter
Opening Method
Front-opening door
Gas Control
Flow Control
3-channel mass flow controllers:Range: 0–500 SCCM;Range: 0–100 SCCM;Range: 0–20 SCCM
Bipolar Pulsed Magnetron Sputtering Power Supply
Input Voltage
380 VAC ±10%, 3-phase 4-wire system, 50–60 Hz
Output Power
0–5 kW
Output Voltage
0–1000 V
Output Current
Max. 9 A (at constant power)
Output Frequency
1 kHz – 150 kHz
Output Characteristics
Constant current / Constant power / Constant voltage
Dongguan Lonroy Equipment Co., Ltd, located in Dongguan, Guangdong, is a leading company specializing in the research and development, manufacturing and sales of high-tech and high-precision testing equipment. With 20 years of industry experience, we are committed to providing excellent tes...
Dongguan Lonroy Equipment Co., Ltd, located in Dongguan, Guangdong, is a leading company specializing in the research and development, manufacturing and sales of high-tech and high-precision testing equipment. With 20 years of industry experience, we are committed to providing excellent tes...