| Material | High Purity Fused Silica (SiO2 > 99.99%) |
| Dimensions | 36mm x 32mm x 580mm |
| Max Operating Temperature | 1100°C |
| Chemical Resistance | HF, Strong Acid & Alkali, Organic Solvents |
| Thermal Shock Resistance | Excellent, Low CTE 5.5 x 10^-7 /°C |
| Transmittance | UV-Visible Range |
| Purity | No Metal Ion Precipitation |
| Application | Lab Distillation, Fine Chemical Purification, Semiconductor Pretreatment, Environmental Digestion |
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Product Specification
| Material | High Purity Fused Silica (SiO2 > 99.99%) | Dimensions | 36mm x 32mm x 580mm |
| Max Operating Temperature | 1100°C | Chemical Resistance | HF, Strong Acid & Alkali, Organic Solvents |
| Thermal Shock Resistance | Excellent, Low CTE 5.5 x 10^-7 /°C | Transmittance | UV-Visible Range |
| Purity | No Metal Ion Precipitation | Application | Lab Distillation, Fine Chemical Purification, Semiconductor Pretreatment, Environmental Digestion |
| High Light | 36x32x580mm quartz instrument ,high purity quartz instrument ,Chemical Purification quartz instrument | ||
The High Purity Quartz Instrument (36mm x 32mm x 580mm) is a versatile quartz glass vessel engineered for demanding chemical, semiconductor, and environmental applications. Manufactured from premium fused silica (SiO2 > 99.99%), it delivers exceptional thermal stability up to 1100°C, outstanding chemical inertness against HF and strong corrosive media, and zero metal ion precipitation — making it the preferred choice for high-purity chemical processing and analytical workflows.
| Industry | Application |
|---|---|
| Laboratory Chemistry | High-temperature distillation and reflux reaction container for HF and concentrated acid/alkali reagents under direct flame or electric heating; used for material purification and physicochemical analysis |
| Fine Chemical & New Materials | Wet synthesis and acid pickling purification vessel for high-purity raw materials; prevents metal impurity doping to ensure final product purity |
| Semiconductor Industry | Electronic-grade reagent distillation and precursor raw material pretreatment container; meets ultra-clean manufacturing requirements for electronic materials |
| Environmental Testing | High-temperature digestion cell for waste gas and liquid sample pre-processing; corrosion-resistant against aggressive digestion reagents |
vs. Borosilicate Glass Instrument: Withstands hydrofluoric acid and continuous operation at 1100°C vs ~500°C limit; excellent thermal shock resistance prevents cracking under rapid temperature changes; ultra-high purity eliminates ion precipitation and sample contamination
vs. PTFE/Teflon Instrument: Suitable for high-temperature applications where PTFE softens above 260°C; transparent wall enables visual process monitoring; rigid structure maintains dimensional stability under thermal cycling
| Parameter | Value |
|---|---|
| Material | High Purity Fused Silica (SiO2 > 99.99%) |
| Dimensions | 36mm x 32mm x 580mm |
| Max Operating Temperature | 1100°C |
| Chemical Resistance | HF, Strong Acid & Alkali, Organic Solvents |
| Thermal Shock Resistance | Excellent, Low CTE 5.5 x 10^-7 /°C |
| Transmittance | UV-Visible Range |
| Purity | No Metal Ion Precipitation |
Company Details
Business Type:
Manufacturer,Seller
Year Established:
1998
Total Annual:
2000000-3000000
Employee Number:
200~500
Ecer Certification:
Verified Supplier
Yantai ZK Optics Co., Ltd., is founded in year 1998, it is a high-tech comprehensive glass processing enterprise integrating R&D, production and sales. The product sales have been spread all over the world, and are trusted by users in Asia, Europe, the United states, South Korea and India. It ha... Yantai ZK Optics Co., Ltd., is founded in year 1998, it is a high-tech comprehensive glass processing enterprise integrating R&D, production and sales. The product sales have been spread all over the world, and are trusted by users in Asia, Europe, the United states, South Korea and India. It ha...
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