guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.

China,Dongguan ,Guangdong
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Semiconductor Wafer Cleaning Machine 120KW Ultrasound Washing Machine 40KHZ /

China Semiconductor Wafer Cleaning Machine 120KW Ultrasound Washing Machine 40KHZ /

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Semiconductor Wafer Cleaning Machine 120KW Ultrasound Washing Machine 40KHZ /

MOQ： 1
Price：￥800000
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Payment Terms	T/T
Supply Ability	One unit. It will take 30 to 60 days.
Delivery Time	30-60work days
Packaging Details	Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M2M2.8M
Name	Semiconductor Cleaning Machine
Cleaning temperature	60℃
Model	JTM-100504AD
Type	Ultrasonic alkaline washing+Ultrasonic acid washing+Pure water rinsing
Cleaning Frequency	40KHZ/80KHZ
Number of Tanks	10
Overall Dimensions	12M2M2.8M
Power	120KW
Brand Name	Jietai
Model Number	JTM-100504AD
Certification	CE, FCC, ROHS, etc.
Place of Origin	Dongguan, Guangdong

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Product Details
Company Details

Product Specification


Payment Terms	T/T	Supply Ability	One unit. It will take 30 to 60 days.
Delivery Time	30-60work days	Packaging Details	Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M2M2.8M
Name	Semiconductor Cleaning Machine	Cleaning temperature	60℃
Model	JTM-100504AD	Type	Ultrasonic alkaline washing+Ultrasonic acid washing+Pure water rinsing
Cleaning Frequency	40KHZ/80KHZ	Number of Tanks	10
Overall Dimensions	12M2M2.8M	Power	120KW
Brand Name	Jietai	Model Number	JTM-100504AD
Certification	CE, FCC, ROHS, etc.	Place of Origin	Dongguan, Guangdong
High Light	Semiconductor Wafer Cleaning Machine ，Wafer Cleaning Machine 120KW ，Ultrasound Washing Machine 40KHZ

Semiconductor Wafer Cleaner, Ultrasonic Alkaline Cleaning + Ultrasonic Acidic Cleaning + Pure Water Rinsing

Core technical advantages

I. Three-tank gradient cleaning system

1. Ultrasonic alkaline cleaning tank (pH 10-13)

Technical parameters:

▶ Frequency: 80kHz/120kHz Dual-frequency switching (support pulsed ultrasound) ▶ Tank material: modified PTFE liner + 316L stainless steel frame (130℃ high temperature resistance, NaOH / ammonia corrosion resistance)

▶ Cleaning medium: alkaline solution such as potassium hydroxide (KOH), tetramethylammonium hydroxide (TMAH), etc.

Core Functions: ✔ Efficient stripping of photoresist residue: destroying the molecular bond of the adhesive film through cavitation effect, together with 50-80℃ constant temperature control, removing 99.9% of SU-8 / positive photoresist within 15 minutes

✔ Particle contaminant capture: built-in micron-sized PP cartridge (5μm) + Magnetic Filter (capturing Fe/Co and other metal particles). ✔ Real-time filtration of cleaning waste

2. Ultrasonic Acid Cleaning Tank (pH 1-3)

Technical Parameters:

▶ Frequency: 150kHz high-frequency ultrasonication (reduces the size of cavitation bubbles to minimize wafer surface damage)

▶ Tank Material: Perfluoroalkoxy Resin (PFA) liner (HF-resistant). PFA) liner (resistant to HF/HNO₃ mixed acid)

▶ Cleaning medium: BOE buffer oxide etchant (HF:NH₄F=1:6), aqua regia (HNO₃:HCl=1:3)

Core functions:

✔ Depth of metal ion removal ✔ Surface roughness control: for Al/Cu electrode residue, through acid etching + ultrasonic vibration, make Na⁺/K⁺ residue <10¹⁰ atoms/cm²

✔ Surface roughness control: ultrasonic power dynamically adjusted (50-300W), together with the precision of temperature control ±0.5 ℃, to ensure that the wafer Surface Ra value ≤ 0.2nm

3. Pure water megasonic rinsing tank (resistivity ≥ 18.2MΩ・cm)

Technical Parameters:

▶ Frequency: 850kHz MF ultrasound (cavitation threshold > 200μm, to avoid liquid impact damage)

▶ Water quality Monitoring: online TOC detector (detection accuracy ≤ 5ppb) + particle counter (0.1μm particle size detection)

▶ Rinsing method: countercurrent rinsing (pure water utilization rate increased to 85%) + megasonic cavitation (stripping submicron particles)

Core features:

✔ Residue-free cleanliness: Adopt DI water three-stage filtration (activated carbon + RO membrane + polishing resin), with overflow rate of 50L/min, to realize TOC residual <10ppb within 10 minutes

✔ Edge-enhanced cleaning: patented rotating spray arm (speed 0-300rpm adjustable), to solve the cleaning blind spot of 1mm area at the edge of the wafer.

Company Details

Bronze Gleitlager

Bronze Sleeve Bushings

and

Graphite Plugged Bushings

from Quality China Factory

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Business Type:

Manufacturer 
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Year Established:

2005 


Total Annual:

4,397,596.73-6,397,596.73


Employee Number:

460~500 


Ecer Certification：

Verified Supplier 

Jietai Ultrasonic was founded in 2005 and specializes in environmental ultrasonic cleaning equipment, wastewater purification equipment, surface treatment equipment, and supporting systems. As a high-tech enterprise integrating R&D, production, sales, and engineering services, we are committed t... Jietai Ultrasonic was founded in 2005 and specializes in environmental ultrasonic cleaning equipment, wastewater purification equipment, surface treatment equipment, and supporting systems. As a high-tech enterprise integrating R&D, production, sales, and engineering services, we are committed t...

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guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.
2nd Floor, Unit 2, Building 16, No. 7, Science and Technology Avenue, Houjie Town, Dongguan City, Guangdong Province
https://www.ultrasoniccleaning-machine.com/

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