Industrial Dual-Head Spin Coating System for High-Throughput Production –

This customizable dual-station spin coater is designed for high-throughput thin-film deposition on substrates such as silicon wafers, glass, and polymer films. Available in research, cleanroom, and industrial production configurations. The system is fully customizable in chuck size, spin speed range, number of program steps, and dispensing method. Two independent stations allow simultaneous or alternating operation - one station can coat while the other is being loaded/unloaded, dramatically increasing productivity. Ideal for photoresist coating, sol-gel deposition, and barrier layer applications in semiconductor, MEMS, optics, and printed electronics industries.

• Semiconductor: Photoresist coating on silicon wafers, MEMS devices
• Optoelectronics: Thin-film deposition for LEDs, solar cells, flat panel displays
• Materials science: Sol-gel, polymer, and nanocomposite coatings
• Biomedical: Bio-sensor and microfluidic device fabrication
• Printed electronics: Conductive ink deposition on flexible substrates
• Packaging: Barrier coating on food containers and paper products

This dual-station spin coater is highly customizable to meet your specific application requirements:

• Chuck design & size: Custom-machined vacuum chucks for substrates from 10 mm to 450 mm
• Spin speed range: Extendable up to 15,000 rpm for ultra-thin film applications
• Number of stations: Expandable to 3 or 4 stations for multi-batch processing
• Dispense system: Manual, semi-auto, or fully automated with servo-controlled pumps
• Environmental control: Cleanroom (Class 10-100,000), inert gas purge, humidity control
• Thermal integration: Built-in hot plate (up to 300°C) or UV curing module
• Automation: Robotic loading/unloading, conveyor integration, batch processing
• Enclosure material: Solvent-resistant PTFE, stainless steel, or explosion-proof design

• Parallel processing: Two stations operate independently - coat and load simultaneously, doubling throughput vs. single-station units
• Independent recipe control: Each station runs different materials or spin parameters concurrently
• High precision: Brushless DC or servo motor with ±1 rpm stability for exceptional uniformity
• Chemical-resistant chamber: Stainless steel construction with solvent-resistant coating for cleanroom compatibility
• Safety interlocks: Lid interlock and emergency stop on each station
• Data traceability: Recipe storage, real-time monitoring, USB/Ethernet export (optional)
• Low maintenance: Vibration-free design with sealed bearings

• Free process consulting and material testing (send us your substrates)
• On-site installation, calibration, and operator training
• 12-month warranty on all components, lifetime technical support
• Spare parts availability (chucks, pumps, motors) within 48 hours
• Remote troubleshooting via video call or IoT monitoring (customizable)

• Packing: Anti-static foam + reinforced plywood case (with desiccant for moisture-sensitive components)
• Shipping: FOB Shanghai / CIF by sea, air, or rail. Lead time: 15-30 days after customization confirmation (longer for custom chucks or automation integration)

A: A dual-station machine shares one control system and footprint while allowing one operator to load/unload one station while the other is coating - eliminating idle time. This results in lower total investment, smaller lab space, and higher throughput.

A: Yes. Each station has independent programmable controls, allowing you to coat different materials or substrate sizes at the same time without cross-contamination.

A: Chucks are customizable based on your substrate dimensions and material. We offer standard chucks for round wafers (2"-12") and custom-machined chucks for square, rectangular, or irregular substrates.