horizontal magnetron sputtering coating equipment pvd vacuum coating machine for

Product Specification

Introduction
Structure:

Horizontal vacuum chamber, magnetic control target assembly, horizontal transmission system, vacuum acquisition and detection system, industrial control system, substrate ionization and temperature control system.

Working principle:

In a vacuum environment, working gas is introduced. The plasma is confined by a magnetic field, causing high-energy ions to bombard the target material. The atoms of the target material are detached and horizontally deposited on the surface of the substrate that is traveling at a constant speed to form a film.

Features
The structure is modular and highly expandable:

The coating chambers are mostly of modular structure, which can flexibly adjust the positions of the cathode and pump group according to process requirements. The number of chambers can also be increased as needed, and even double-sided coating function can be achieved. For instance, to meet the composite requirements of different film layers, continuous deposition of multi-layer films can be achieved by increasing or decreasing the sputtering chambers and matching different target materials.

High degree of automation and intelligence:

The mainstream models are equipped with industrial control computer systems, which can achieve fully automatic operation. They are also equipped with automatic workpiece rack transportation or automatic material rack return systems. When combined with mechanical arms, they can also connect the previous and subsequent processes. It simultaneously supports remote network maintenance detection and coating process monitoring. During the production process, there are also alarm prompts and fault displays, facilitating timely problem identification.

Excellent coating compatibility and uniformity:

The optimized target structure and reasonable target base layout design, combined with a rotatable sample stage or a stable horizontal transmission system, can enhance the sputtering uniformity. For example, in the effective deposition area of some LOW-E production lines, the uniformity of the film layer thickness is ≤± 5%. Moreover, the substrate dissociation system can activate the product surface, further ensuring the consistency of the coating on different material substrates.

Advantages
High production efficiency and controllable cost:

The continuous horizontal transmission design does not require frequent start and stop of equipment, and the equipment cycle is fast. For example, the single production cycle of some production lines is only 60 seconds, and the annual output can exceed 2 million square meters.

 Meanwhile, designs such as automatic material rack return save manpower, and the application of domestic components also reduces the cost of equipment failure recovery and usage. In the capacitor manufacturing process, this equipment can also replace silver paste printing, further reducing production costs.

The quality of the film layer is stable and reliable:

 With the help of the substrate ionization system and the optimized sputtering process, the deposited film layer has a dense structure, strong adhesion and is not easy to fall off. Moreover, the design of small-angle sputtering with a rotating target not only facilitates the deposition of film layers on the inner surface of small apertures but also meets the coating requirements of some complex-structured substrates.

Energy-saving, environmentally friendly and easy to operate and maintain:

It adopts a dry process, with no discharge of chemical liquid waste, and complies with RoHS/REACH environmental protection regulations. Some equipment vacuum systems are equipped with molecular pumps for air extraction, which has relatively low energy consumption. Meanwhile, the cathode baffle structure can shorten the cycle of target material replacement and cleaning, and reduce the workload of equipment maintenance.

Application
In the field of architectural and automotive glass:

It is the core equipment for LOW-E glass production, capable of coating low-emissivity films on the surface of flat glass to achieve heat insulation and energy-saving effects. Some production lines can handle glass of 9000mm×2540mm specifications, making it suitable for large-scale production of architectural curtain walls and automotive windshields.

In the field of electronic components:

It is widely used in the coating of ceramic capacitors, varistors, LED ceramic brackets and other products, and can prepare conductive films or protective films with high adhesion, replacing the traditional silver paste printing process to improve efficiency. It can also be used for coating electronic product hardware parts to enhance their surface hardness and corrosion resistance.

In the field of decoration and optics:

It can be used to deposit compound film layers such as TiN and CrN on the surface of hardware accessories for high-end watches, jewelry, etc., presenting various colors such as furnace gold and rose gold. In addition, electromagnetic shielding films, anti-reflective films, etc. can be coated on the surfaces of substrates such as acrylic and PC, meeting the performance requirements of optical devices.