Annular electron beam electron beam evaporation coating machine customize for

Product Specification

Delivery Time	45-60 work days	Coating Substrate	Metal, Glass, Ceramic, Plastic
Coating Application	Decorative, Functional, Protective	Machine Size	Customizable
Rotation Stand	2 Sets	Evaporation Material	Metal, Alloy, Organic Materials
Cooling System	Water Cooling	Coating Film Material	Au, Ag, Al, Cu, SiO2, etc.
Coating Chamber Size	Customized	Coating Efficiency	High
Deposition Rate	Fast	Vacuum Level	High Vacuum
Coating Size	Customizable	Operation Way	Touch Screen
Coating Temperature	≤200℃	Guarantee Period	1 Year
Operation Mode	Manual/Automatic	Coating Deposition Rate	Adjustable
Brand Name	Zhongda	Certification	CE
Place of Origin	Zhaoqing, Guangdong
High Light	custom electron beam evaporation machine ，annular electron beam coating equipment ，optical electron beam coating system

I. Structural Composition Annular electron beam system: annular filament (cathode), anode, focusing coil, deflection coil; The annular cathode emits hot electrons, which are accelerated by the electric field and focused and deflector by the magnetic field, precisely bombarding the material inside the crucible. Vacuum system: vacuum chamber, mechanical pump, molecular pump/cryogenic pump. The ultimate vacuum usually reaches 10⁻⁴ to 10⁻⁶ Pa, reducing gas-phase collision and contamination. Evaporation source and crucible: Water-cooled copper crucible to prevent evaporation and reaction of crucible materials and enhance the purity of the film layer; It supports multi-station switching and multi-layer film deposition. Substrate stage: It can be heated/cooled by water, and can rotate around the sun/on its own axis to ensure uniform film thickness. Control system: High-voltage power supply, beam control, film thickness monitoring (crystal oscillator), vacuum gauge and automation program, achieving closed-loop control of parameters. Ii. Working Principle Electron beam generation and acceleration: When a toroidal filament is electrified, it emits hot electrons, which are accelerated by a 5-10 kV high-voltage electric field to achieve high energy. Focusing and deflection: The electromagnetic coil focuses and deflates the electron beam onto the surface of the target material inside the crucible, with an energy density that can reach 10⁶ to 10⁷ W/cm². Evaporation and deposition: The kinetic energy of the electron beam is converted into thermal energy, and the target material rapidly heats up to the evaporation point and vaporizes. Gas-phase atoms/molecules are transported in a straight line to the substrate under high vacuum and condense to form a uniform film. Process control: Real-time monitoring of deposition rate and film thickness, dynamic adjustment of beam current and power to ensure process stability. Iii. Core Features High energy density: The local temperature can reach 3000-6000℃, and it can evaporate high-melting-point materials such as tungsten, molybdenum and SiO₂. Extremely low pollution: Water-cooled crucibles reduce crucible pollution, and the purity of the film layer can reach over 99.99%. Efficiency and rate: High thermal efficiency, deposition rate 0.1-100 nm/s, balancing efficiency and film quality. Flexible process: Multi-crucible switching supports multi-layer films. Substrate heating/rotation enhances the compactness and adhesion of the film layer. Iv. Advantages Wide material adaptability: Compatible with metals, alloys, oxides, semiconductors, etc., especially suitable for refractory materials. The film layer quality is excellent: high purity, good density and strong adhesion, meeting the requirements of high-precision optical and electronic devices. Cost-effectiveness: High material utilization rate, energy consumption concentrated on target materials, and lower long-term operating costs. High degree of automation: Parameters are precisely controllable with good repeatability, making it suitable for both scientific research and mass production. V. Typical Applications Optical films: anti-reflection films (AR), high-reflection films, filters, beam splitters, used in glasses, cameras, laser devices, photovoltaic cells. Semiconductors and Microelectronics: Metal electrodes (Al, Cu), dielectric layers (SiO₂, Si₃N₄), sensor films. Functional coatings: decorative films, conductive films (ITO), corrosion-resistant/wear-resistant coatings, applied in aerospace, tools and consumer electronics. Scientific research and small-scale production: Material preparation for universities and research institutes, as well as customized films for MEMS, biomedical devices, etc.