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Shenzhen APG Material Company Limited

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China Rotating / Flat Hafnium Sputtering Target High Melting Point Hf Target
China Rotating / Flat Hafnium Sputtering Target High Melting Point Hf Target

  1. China Rotating / Flat Hafnium Sputtering Target High Melting Point Hf Target
  2. China Rotating / Flat Hafnium Sputtering Target High Melting Point Hf Target

Rotating / Flat Hafnium Sputtering Target High Melting Point Hf Target

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Packaging Details Vacuum-sealed packaging, case-packed for storage and transport
Delivery Time 4-5 weeks
Payment Terms T/T
Supply Ability Stable supply
Purity 99.9%-99.99%
Density 13.31 g/cm³
Name Hafnium Target (Hf)
Forming Process Hot Pressing Sintering
Product Specifications Flat target, Rotating target
Application Fields Semiconductor Manufacturing, Optical Device Manufacturing. Nuclear Industry, Aerospace and High-Temperature Protection
Brand Name APG
Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949

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  1. Product Details
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Product Specification

Packaging Details Vacuum-sealed packaging, case-packed for storage and transport Delivery Time 4-5 weeks
Payment Terms T/T Supply Ability Stable supply
Purity 99.9%-99.99% Density 13.31 g/cm³
Name Hafnium Target (Hf) Forming Process Hot Pressing Sintering
Product Specifications Flat target, Rotating target Application Fields Semiconductor Manufacturing, Optical Device Manufacturing. Nuclear Industry, Aerospace and High-Temperature Protection
Brand Name APG Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949
High Light Flat Hafnium Sputtering TargetRotating Hafnium Sputtering TargetHafnium Hf Target

Hafnium targets are sputtering targets made from high-purity hafnium metal (Hf), featuring a high melting point (~2227℃), excellent corrosion resistance, good ductility, and outstanding thermal neutron absorption. They are widely used in semiconductor manufacturing, optical coatings, nuclear industry, and high-temperature alloys. Hafnium is a critical strategic material in the electronics and energy industries, especially for advanced chip processes and nuclear reactors.

Excellent Properties of Hafnium Targets

 

l Ultra-high Melting Point and Thermal Stability


Maintains structural stability in high-temperature environments, suitable for high-temperature coating processes and extreme conditions.

 

 

l Excellent Corrosion Resistance


Highly resistant to most acids, bases, and chemical media, enabling long-term use in harsh environments.

 

 

l High purity and superior film performance


Sputtered films are uniform and dense; hafnium compounds (e.g., HfO₂) have low absorption in the UV optical range, making them ideal high-refractive-index materials for semiconductors and optical coatings.

 

 

l Key role in advanced semiconductor processes


Hafnium compounds (e.g., HfO₂) are core high-k dielectric materials, widely used in advanced logic devices and memory chips to improve integration and reduce power consumption.

 

Applications of Hafnium Targets

 

l Semiconductor Manufacturing


Hafnium targets are essential for producing high-k dielectric films, such as HfO₂, extensively used in advanced logic devices, MOSFETs, and DRAM memories. Their high-k properties effectively reduce device leakage current and enhance integration and performance, making them indispensable for 7nm and more advanced processes.

 

 

l Optical Device Manufacturing


Hafnium targets are used to produce high-refractive-index HfO₂ films in optics, applied in laser optical systems, interference filters, infrared windows, and precision lenses. These films enhance the optical transmittance and high-temperature resistance, meeting the strict quality requirements of high-end optical systems.

 

 

l Nuclear Industry


Sputtered films can be used in reactor control systems and protective structures due to hafnium's extremely high neutron absorption cross-section. Hafnium coatings play a critical role in nuclear safety and are irreplaceable functional materials in the nuclear field.

 

 

l Aerospace and High-Temperature Protection


Hafnium targets are used to create high-temperature oxidation-resistant coatings for jet engines, gas turbine blades, and other high-temperature components. Their high melting point and chemical stability ensure reliability in extreme aerospace environments, extending overall system lifespan.

 

 

Company Details

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Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people. APG specializes in the research and development (R&D) and production of PVD materials (sputtering targ... Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people. APG specializes in the research and development (R&D) and production of PVD materials (sputtering targ...

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  • Shenzhen APG Material Company Limited
  • HQ Add:Rooms 1401,Bldg.2,Runzhi R&D Center,CRB Tech-Innovative City, Xinan Street,Bao'an District,Shenzhen,China
  • https://www.apgsputtertarget.com/

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