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Shenzhen APG Material Company Limited

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China MoNb Metal Sputtering Target High Purity Molybdenum Niobium Target
China MoNb Metal Sputtering Target High Purity Molybdenum Niobium Target

  1. China MoNb Metal Sputtering Target High Purity Molybdenum Niobium Target

MoNb Metal Sputtering Target High Purity Molybdenum Niobium Target

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Packaging Details Vacuum-sealed packaging, case-packed for storage and transport
Delivery Time 4-5 weeks
Payment Terms T/T
Supply Ability Stable supply
Purity 99.9%-99.99%
Proportioning Customizable Ratio
Name Molybdenum Niobium Target (MoNb)
Forming Process Pressing, Sintering
Product Specifications Planar targets, rotating targets, irregularly shaped targets
Application Scenarios Semiconductor Manufacturing, Display Panels, Photovoltaic Industry, Aerospace
Brand Name APG
Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949

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  1. Product Details
  2. Company Details

Product Specification

Packaging Details Vacuum-sealed packaging, case-packed for storage and transport Delivery Time 4-5 weeks
Payment Terms T/T Supply Ability Stable supply
Purity 99.9%-99.99% Proportioning Customizable Ratio
Name Molybdenum Niobium Target (MoNb) Forming Process Pressing, Sintering
Product Specifications Planar targets, rotating targets, irregularly shaped targets Application Scenarios Semiconductor Manufacturing, Display Panels, Photovoltaic Industry, Aerospace
Brand Name APG Place of Origin china
Certification ISO9001、ISO14001、ISO45001、IAFT16949
High Light MoNb Metal Sputtering TargetMolybdenum Niobium Target High PurityMetal Sputtering Target

Engineered from high-purity powders this alloy combines the exceptional hardness, thermal resilience, and high melting point characteristic of molybdenum with the superior electrical conductivity and chemical inertness of niobium. MoNb targets are used to prepare wear-resistant, high-temperature-resistant, and corrosion-resistant functional films, with applications in semiconductor, optical, energy, and high-end decorative coating fields. The MoNb films produced by sputtering have high density, good adhesion, and stable physical and chemical properties.

Core Advantages of MoNb Target

 

l High Temperature Resistance


The molybdenum content provides a high melting point and good thermal stability, allowing the film to remain stable during high-temperature sputtering processes, suitable for high-power deposition.

l Strong Corrosion Resistance

Niobium enhances film resistance against acid, alkali, and oxidation environments, extending the lifespan of the films and devices.

 

 

l Good Electrical Conductivity


The alloy film has stable electrical conductivity, making it suitable for use in electronic devices, functional films, and transparent conductive films.

 

 

l High Hardness and Wear Resistance


MoNb films have high hardness and wear resistance, suitable for protective coatings and high-end decorative coatings, enhancing durability.

 

 

l Good Film Density


Sputtered films are uniform having strong adhesion which ensure film stability in diverse applications.

 

Main Applications of MoNb Target

 

l  Semiconductor Manufacturing


MoNb targets can be used to prepare conductive layers, interconnect layers, or shielding layers, providing stable electrical performance and long-term reliability for semiconductor devices and electronic components.

l Display Panels


Used to deposit functional films such as transparent electrode auxiliary layers, gate electrodes, or interconnect lines in LCD, OLED, and Mini/Micro LED display panels. Core advantages: good flexibility, strong interface adhesion with transparent conductive layers (ITO/IZO), and high sputtering uniformity.

l Photovoltaic Industry


Mainly used for back electrodes or conductive backplates in thin-film photovoltaic cells (such as CIGS, CdTe cells). Core advantages: high temperature resistance, resistance to photovoltaic electrolyte corrosion, and low contact resistance.

 

 l Aerospace


MoNb films have high hardness, high-temperature resistance, and corrosion resistance, making them suitable for surface protection of aerospace and high-temperature industrial equipment, extending the lifespan of critical components.

Company Details

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Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people. APG specializes in the research and development (R&D) and production of PVD materials (sputtering targ... Shenzhen APG Material Company Limited (APG), headquartered in Shenzhen, China, currently operates three factories located in Shenzhen, Changzhou, and Changsha, and employs more than 200 people. APG specializes in the research and development (R&D) and production of PVD materials (sputtering targ...

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  • Shenzhen APG Material Company Limited
  • HQ Add:Rooms 1401,Bldg.2,Runzhi R&D Center,CRB Tech-Innovative City, Xinan Street,Bao'an District,Shenzhen,China
  • https://www.apgsputtertarget.com/

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