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SHANGHAI FAMOUS TRADE CO.,LTD

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China SiC Ceramic Vacuum Chuck ​​Flip-Chip Bonding Mirror Polishing High-Stiffness​​
China SiC Ceramic Vacuum Chuck ​​Flip-Chip Bonding Mirror Polishing High-Stiffness​​

  1. China SiC Ceramic Vacuum Chuck ​​Flip-Chip Bonding Mirror Polishing High-Stiffness​​
  2. China SiC Ceramic Vacuum Chuck ​​Flip-Chip Bonding Mirror Polishing High-Stiffness​​
  3. China SiC Ceramic Vacuum Chuck ​​Flip-Chip Bonding Mirror Polishing High-Stiffness​​

SiC Ceramic Vacuum Chuck ​​Flip-Chip Bonding Mirror Polishing High-Stiffness​​

  1. MOQ: 25
  2. Price: By case
  3. Get Latest Price
Payment Terms T/T
Delivery Time 2-4 weeks
Packaging Details package in 100-grade cleaning room
​ Coefficient of Thermal Expansion < 3.5 × 10⁻⁶/°C
Elastic Modulus > 300 GPa
Bulk Density > 3.1 g/cm³
Surface Flatness ≤ 1 μm
Surface Roughness (Ra) ≤ 0.01 μm
Adsorption Groove Accuracy ± 5 μm
Brand Name ZMSH
Model Number SiC Ceramic Vacuum Chuck
Certification rohs
Place of Origin CHINA

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Product Specification

Payment Terms T/T Delivery Time 2-4 weeks
Packaging Details package in 100-grade cleaning room ​ Coefficient of Thermal Expansion < 3.5 × 10⁻⁶/°C
Elastic Modulus > 300 GPa Bulk Density > 3.1 g/cm³
Surface Flatness ≤ 1 μm Surface Roughness (Ra) ≤ 0.01 μm
Adsorption Groove Accuracy ± 5 μm Brand Name ZMSH
Model Number SiC Ceramic Vacuum Chuck Certification rohs
Place of Origin CHINA

SiC Ceramic Vacuum Chuck Abstract

 

SiC Ceramic Vacuum Chuck ​​Flip-Chip Bonding Mirror Polishing High-Stiffness​​

 
 
 

A Flip-Chip Bonding Vacuum Chuck is a high-precision vacuum adsorption component specifically designed for ​​Flip-Chip Bonding processes​​ in semiconductor manufacturing. Its core function is to ​​stably adsorb and secure wafers or dies​​ during bonding, ensuring ​​micrometer or even sub-micrometer-level alignment and interconnection​​ with the substrate. Typically fabricated from ​​ultra-high-purity silicon (Si), silicon carbide (SiC), or specialty ceramics​​, it features internally precision-machined air channels and adsorption grooves. When connected to a negative pressure source, it generates a uniform negative pressure field, enabling ​​non-contact or low-contact-stress adsorption​​ of wafers to avoid damaging sensitive circuit patterns.

 

 


 

SiC Ceramic Vacuum Chuck Data

 

 

​​Parameter Name​​ ​​Typical Value/Range​​
Coefficient of Thermal Expansion < 3.5 × 10⁻⁶/°C
Elastic Modulus > 300 GPa
Bulk Density > 3.1 g/cm³
Surface Flatness ≤ 1 μm
Surface Roughness (Ra) ≤ 0.01 μm
Adsorption Groove Accuracy ± 5 μm

 

 


 

SiC Ceramic Vacuum Chuck Application Areas

 
  • Flip-Chip Interconnection Processes​​: For precise alignment and bonding of high-end chips (e.g., CPUs, GPUs, FPGAs) to packaging substrates.
  • ​​Wafer-Level Packaging (WLP)​​: Used in Fan-In and Fan-Out packaging to adsorb and secure wafers for ​​bump formation, redistribution layer (RDL) patterning, and bonding​​.
  • ​​2.5D/3D Integration​​: Enables precise pick-and-place and bonding of multiple dies during ​​silicon interposer-based or chip-stacking processes​​.
  • ​​MEMS Packaging​​: Facilitates non-destructive handling and packaging of sensitive structures in microelectromechanical systems.

 

 


 

SiC Ceramic Vacuum Chuck Features

​​1. Precision Air Channel Machining​​: Utilizes ​​micro-machining technologies (e.g., micro-milling, laser processing)​​ to create complex and uniform air networks, ensuring highly consistent adsorption force distribution and preventing wafer warping or slippage.

 

2. ​​Mirror Polishing​​: The working surface undergoes ​​nanoscale polishing​​, achieving extremely low roughness (Ra ≤ 0.01μm), effectively reducing particulate contamination and electrostatic discharge (ESD) risks, and protecting wafer backside quality.

 

3. ​​Ultra-Low Thermal Expansion Coefficient​​: The material’s CTE ​​closely matches silicon wafers (typically < 4.5×10⁻⁶/℃)​​, maintaining exceptional dimensional stability and alignment accuracy during thermal cycles (e.g., heating-bonding-cooling) in bonding processes.

 

​​4. High Stiffness​​: The material’s ​​high elastic modulus (> 300 GPa)​​ and optimized structural design minimize deformation under bonding pressure, ensuring chip ​​coplanarity and uniform bonding​​.

 

5. ​​High Density​​: The substrate exhibits ​​very low porosity (typically < 0.5%)​​, is non-porous, avoids gas retention and contaminant ingress, and meets the stringent requirements for ultra-high vacuum and cleanliness in semiconductor processes.

 

​​6. Exceptional Flatness and Parallelism​​: The overall flatness and parallelism to the mounting reference surface ​​can reach within 1 micrometer (1μm)​​, providing an absolute flat reference for chips, which is fundamental for ultra-precision bonding.

 

 


 

Recommended Customized SiC Ceramics

 

 

1. ​​Customized SiC Boats Vertical & Horizontal Wafer Carriers​​

 
 

 

 

2. ​​Customized SiC Ceramic Suction Cups for Lithography Applications​​

 

 

 

 


 

SiC Ceramic Vacuum Chuck FAQ

 

Q1: What is the primary function of a flip-chip bonding vacuum chuck?​​

​​A1:​​ It is designed to ​​stably adsorb and secure wafers or dies​​ during flip-chip bonding processes, ensuring ​​micrometer or sub-micrometer-level alignment​​ between chips and substrates through vacuum force, which is critical for high-precision semiconductor packaging .

 

 

​​Q2: Why are materials like silicon carbide (SiC) preferred for flip-chip bonding vacuum chucks?​​

​​A2:​​ Silicon carbide is chosen for its ​​extremely low thermal expansion coefficient (~4.5×10⁻⁶/°C), high stiffness (>300 GPa), and exceptional chemical inertness​​, which ensure dimensional stability under high temperatures, prevent deformation during bonding, and resist corrosion from process gases like acids or plasmas .

 

 


Tags: #​​ SiC Ceramic Vacuum Chuck, #​​Flip-Chip Bonding, #High-Purity, #Customized, #SiC Ceramics​​, #Mirror Polishing, #High-Stiffness​​

 

 
  
 

Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

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Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer,Agent,Importer,Exporter,Trading Company

  • Year Established:

    2013

  • Total Annual:

    1000000-1500000

  • Ecer Certification:

    Verified Supplier

    SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014.    We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components wi...     SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014.    We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components wi...

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  • SHANGHAI FAMOUS TRADE CO.,LTD
  • Room.1-1805,No.1079 Dianshanhu Road,Qingpu Area Shanghai city, China /201799
  • https://www.galliumnitridewafer.com/

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