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SHANGHAI FAMOUS TRADE CO.,LTD

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China 2-Inch Zn-Doped Gallium Arsenide (GaAs) Wafer for LED & Laser Diode Applications
China 2-Inch Zn-Doped Gallium Arsenide (GaAs) Wafer for LED & Laser Diode Applications

  1. China 2-Inch Zn-Doped Gallium Arsenide (GaAs) Wafer for LED & Laser Diode Applications
  2. China 2-Inch Zn-Doped Gallium Arsenide (GaAs) Wafer for LED & Laser Diode Applications
  3. China 2-Inch Zn-Doped Gallium Arsenide (GaAs) Wafer for LED & Laser Diode Applications
  4. China 2-Inch Zn-Doped Gallium Arsenide (GaAs) Wafer for LED & Laser Diode Applications
  5. China 2-Inch Zn-Doped Gallium Arsenide (GaAs) Wafer for LED & Laser Diode Applications

2-Inch Zn-Doped Gallium Arsenide (GaAs) Wafer for LED & Laser Diode Applications

  1. MOQ: 100
  2. Price:
  3. Get Latest Price
Payment Terms T/T
Delivery Time 2-4 weeks
Material Gallium Arsenide (GaAs)
Dopant Zinc (Zn)
Wafer Type P-Type Semiconductor Wafer
Growth Method VGF
Crystal Structure Zinc Blende
Crystal Orientation (100) ± 0.5°
Misorientation 50.8 ± 0.2 mm
Thickness 220 – 350 ± 20 µm
Orientation Flat 16 ± 1 mm
Identification Flat 8 ± 1 mm
Flat / Notch Option EJ, US, or Notch
Surface Finish P/P or P/E
Carrier Concentration (0.3 – 1.0) × 10¹⁸ cm⁻³
Brand Name ZMSH
Place of Origin SHANGHAI,CHINA

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Product Specification

Payment Terms T/T Delivery Time 2-4 weeks
Material Gallium Arsenide (GaAs) Dopant Zinc (Zn)
Wafer Type P-Type Semiconductor Wafer Growth Method VGF
Crystal Structure Zinc Blende Crystal Orientation (100) ± 0.5°
Misorientation 50.8 ± 0.2 mm Thickness 220 – 350 ± 20 µm
Orientation Flat 16 ± 1 mm Identification Flat 8 ± 1 mm
Flat / Notch Option EJ, US, or Notch Surface Finish P/P or P/E
Carrier Concentration (0.3 – 1.0) × 10¹⁸ cm⁻³ Brand Name ZMSH
Place of Origin SHANGHAI,CHINA
High Light 2-inch GaAs wafer for LEDZn-doped GaAs waferGaAs wafer for laser diode

2-Inch Zn-Doped Gallium Arsenide (GaAs) Wafer for LED & Laser Diode Applications


Product Overview


The 2-inch Zn-doped Gallium Arsenide (GaAs) wafer is a high-quality p-type semiconductor wafer manufactured using the Vertical Gradient Freeze (VGF) crystal growth method. Zinc doping provides stable and uniform p-type electrical characteristics, enabling reliable performance in LED, laser diode, optoelectronic, and microelectronic device fabrication.



As a direct bandgap III–V semiconductor, GaAs offers high carrier mobility, fast electronic response, and excellent optical efficiency. This wafer is supplied with (100) crystal orientation, controlled carrier concentration, low etch pit density, and polished surface finishes, ensuring consistent process performance and high device yield. Tight control of flatness, bow, warp, and particle contamination supports advanced wafer processing and epitaxial growth using MBE or MOCVD techniques.


With optional orientation flats, notch configurations, and backside laser marking, the 2-inch Zn-doped GaAs wafer provides flexibility for different process flows and identification requirements. Its stable electrical properties and reliable surface quality make it suitable for both research and volume production environments in optoelectronic and high-frequency device manufacturing.


Technical Specifications – 2-Inch Zn-Doped GaAs Wafer


Item Specification
Material Gallium Arsenide (GaAs)
Dopant Zinc (Zn)
Wafer Type P-Type Semiconductor Wafer
Growth Method VGF
Crystal Structure Zinc Blende
Crystal Orientation (100) ± 0.5°
Misorientation 2° / 6° / 15° off (110)
Diameter 50.8 ± 0.2 mm
Thickness 220 – 350 ± 20 µm
Orientation Flat 16 ± 1 mm
Identification Flat 8 ± 1 mm
Flat / Notch Option EJ, US, or Notch
Surface Finish P/P or P/E
Carrier Concentration (0.3 – 1.0) × 10¹⁸ cm⁻³
Resistivity (0.8 – 9.0) × 10⁻³ Ω·cm
Hall Mobility 1,500 – 3,000 cm²/V·s
Etch Pit Density ≤ 5,000 cm⁻²
Total Thickness Variation ≤ 10 µm
Bow / Warp ≤ 30 µm
Particle Count < 50 (≥ 0.3 µm per wafer)
Laser Marking Backside or upon request
Packaging Single wafer container or cassette, aluminum composite outer bag


Applications


  • LED wafer processing

  • Laser diode wafer fabrication

  • Optoelectronic device wafers

  • RF and high-frequency electronic wafers


Frequently Asked Questions


Is this GaAs wafer suitable for LED and laser diode manufacturing?
Yes. The Zn-doped p-type electrical characteristics, combined with (100) orientation and controlled carrier concentration, support stable light emission and consistent device performance in LED and laser diode manufacturing.


Can this wafer be used directly for epitaxial growth?
Yes. The wafer is supplied with polished surfaces, low particle contamination, and strict flatness control, allowing direct use in MBE or MOCVD epitaxial growth processes.


Can the wafer specifications be customized for different process requirements?
Yes. Options such as orientation flats, notch configuration, backside laser marking, surface finish, and selected electrical parameters can be adjusted upon request to meet specific equipment and process needs.


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Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

 and 

Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer,Agent,Importer,Exporter,Trading Company

  • Year Established:

    2013

  • Total Annual:

    1000000-1500000

  • Ecer Certification:

    Verified Supplier

    SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014.    We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components widel...     SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014.    We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components widel...

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Get in touch with us

  • Reach Us
  • SHANGHAI FAMOUS TRADE CO.,LTD
  • Room.1-1810,No.1079 Dianshanhu Road,Qingpu Area Shanghai city, China /201799
  • https://www.galliumnitridewafer.com/

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