| Intrinsic Chip ESL | <0.05 nH (de-embedded) |
| Rated Voltage | 100 V DC |
| Packaging Details | |
| Dissipation Factor | ≤0.15% @ 1 kHz, 1.0 Vrms |
| Supply Ability | |
| Delivery Time | 5-7 working days for stock, 3-4 weeks for production |
| ESR @ 1GHz | <0.1 Ohm |
| Dielectric Absorption | <0.05% @ 1 kHz |
| Q Factor @ 1MHz / @ 1GHz | >2000 / >200 |
| Capacitance | 470 pF ±10% (±5% available) |
| Payment Terms | L/C,D/A,D/P,T/T |
| Brand Name | Hoan |
| Place of Origin | Shannxi, China |
| Model Number | HACC471S100V701 |
| Certification | ISO 9001:2015, RoHS |
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Product Specification
| Intrinsic Chip ESL | <0.05 nH (de-embedded) | Rated Voltage | 100 V DC |
| Packaging Details | Dissipation Factor | ≤0.15% @ 1 kHz, 1.0 Vrms | |
| Supply Ability | Delivery Time | 5-7 working days for stock, 3-4 weeks for production | |
| ESR @ 1GHz | <0.1 Ohm | Dielectric Absorption | <0.05% @ 1 kHz |
| Q Factor @ 1MHz / @ 1GHz | >2000 / >200 | Capacitance | 470 pF ±10% (±5% available) |
| Payment Terms | L/C,D/A,D/P,T/T | Brand Name | Hoan |
| Place of Origin | Shannxi, China | Model Number | HACC471S100V701 |
| Certification | ISO 9001:2015, RoHS | ||
| High Light | Symmetrical MOS Capacitor 470pF 100V ,Dual-Polarity MOS Capacitor high dV/dt ,Single Layer Chip Capacitor RF Switching | ||
Product definition: The HACC471S100V701 is a single-layer metal-oxide-semiconductor (MOS) capacitor built on a high-resistivity float-zone silicon substrate with a thermally grown silicon dioxide (SiO2) dielectric. It delivers 470 pF (±10%) at a 100 V DC working voltage in a 0.50 mm × 0.50 mm × 0.15 mm wire-bondable chip. The same device family is also described as a single layer capacitor (SLC) chip, an RF chip capacitor, a wire bondable capacitor, or a MOS chip capacitor.
Its two defining characteristics are symmetrical dual-polarity operation and high dV/dt transient immunity. Together they make the part a good fit for bipolar and AC-coupled RF circuits in which the capacitor must behave identically for positive and negative signal excursions and must tolerate fast voltage ramps.
In a conventional MOS capacitor the measured capacitance depends on the applied bias polarity: one polarity drives the silicon into accumulation (C ≈ Cox) while the opposite polarity drives it toward depletion, lowering the effective capacitance. The HACC471S100V701 uses a symmetrical metal-oxide-semiconductor platform with a degenerate, heavily doped float-zone silicon electrode so the semiconductor capacitance remains far above the oxide capacitance under both bias directions. The result is a near-identical C-V characteristic for positive and negative bias — capacitance holds within ±1% across ±100 V. This makes the device suitable for AC-coupled and bipolar signal paths where the capacitor must behave identically regardless of signal polarity, reducing waveform asymmetry and distortion.
A capacitor subjected to a fast voltage ramp draws a displacement current i = C · dV/dt. The single-layer construction removes the internal electrode stack of a multilayer ceramic capacitor, keeping the equivalent series inductance (ESL) below 0.05 nH and limiting the parasitic voltage overshoot generated during fast transients. Combined with the ≥2.5 µm gold metallization, which provides a robust, low-resistance current path and thermal mass, the HACC471S100V701 withstands rapid dV/dt events such as switching spikes and pulsed-RF envelopes. For a 470 pF device, a 1000 V/µs ramp produces roughly 0.47 A of displacement current, which the part handles without capacitive degradation or metal damage. The 100 V rating with a 250% dielectric withstanding voltage provides additional headroom.
The SiO2 dielectric shows a temperature coefficient of capacitance (TCC) of approximately +35 ppm/°C, nearly linear from -55°C to +125°C, and a low DC bias coefficient (<10 ppm/V). Q exceeds 2000 at 1 MHz and stays above 200 at 1 GHz, while dielectric absorption is typically below 0.05% — important for sample-and-hold and precision integrator stages.
| Parameter | Value | Test Condition |
|---|---|---|
| Capacitance | 470 pF ±10% | 1 MHz, 1.0 Vrms |
| Rated DC Voltage | 100 V | Continuous |
| Dielectric Withstanding Voltage | >250 V DC | 1 minute, 25°C, 100% tested |
| Dual-Polarity Symmetry | ±1% (C+ vs C-) | ±100 V bias |
| TCC | +35 ppm/°C | -55°C to +125°C |
| DC Bias Coefficient | <10 ppm/V | 0 V to rated voltage |
| Q Factor | >2000 @ 1 MHz | Typical |
| Dissipation Factor | ≤0.15% | 1 kHz, 1 Vrms |
| ESL | <0.05 nH | De-embedded |
| SRF | >4 GHz | Chip-level, typical |
| Leakage Current | <10 nA | 100 V DC, 25°C |
| Chip Dimensions | 0.50 × 0.50 × 0.15 mm | ±25 µm |
| Operating Temperature | -55°C to +125°C | — |
| RoHS | Compliant | EU 2015/863 |
| Test | Condition | Result |
|---|---|---|
| Wire Bond Pull | 25 µm Au wire, destructive | >6 gf |
| Moisture Sensitivity | J-STD-020 | MSL 1 |
| TDDB (time-dependent dielectric breakdown) | 125°C, rated voltage | >10 years lifetime |
| Temperature Range | -55°C to +125°C | Full parametric compliance |
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Company Details
Business Type:
Manufacturer
Year Established:
50%-60%
Total Annual:
>1000000
Employee Number:
>100
Ecer Certification:
Verified Supplier
Xi'an Hoan Microwave Co., Ltd. was established in 2005. The company is located in the High-tech Zone of Xi'an. The company covers an area of 800 square meters, including 500 square meters of production area and 300 square meters of office area. It is a professional enterprise specializing in t... Xi'an Hoan Microwave Co., Ltd. was established in 2005. The company is located in the High-tech Zone of Xi'an. The company covers an area of 800 square meters, including 500 square meters of production area and 300 square meters of office area. It is a professional enterprise specializing in t...
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