| Interface Trap Density | 1e10 cm^-2 eV^-1 |
| Substrate Type | p-type Silicon |
| Structure | Metal-Oxide-Semiconductor |
| Temperature Range | -40°C to 125°C |
| Payment Terms | L/C,D/A,D/P,T/T, |
| Delivery Time | 3-5 working days for stock, 2-4 weeks for production |
| Capacitance Range | 1 pF to 100 pF |
| Leakage Current | < 1 nA |
| Frequency Range | 1 kHz to 1 MHz |
| Certification | ISO 9001:2015 |
| Brand Name | Hoan |
| Place of Origin | Shannxi,China |
| Model Number | HACC101S10V500 |
View Detail Information
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Product Specification
| Interface Trap Density | 1e10 cm^-2 eV^-1 | Substrate Type | p-type Silicon |
| Structure | Metal-Oxide-Semiconductor | Temperature Range | -40°C to 125°C |
| Payment Terms | L/C,D/A,D/P,T/T, | Delivery Time | 3-5 working days for stock, 2-4 weeks for production |
| Capacitance Range | 1 pF to 100 pF | Leakage Current | < 1 nA |
| Frequency Range | 1 kHz to 1 MHz | Certification | ISO 9001:2015 |
| Brand Name | Hoan | Place of Origin | Shannxi,China |
| Model Number | HACC101S10V500 | ||
| High Light | High Breakdown Voltage MOS Capacitors ,Low Leakage Wire Bondable Capacitor ,50V Ultra Miniature MOS Capacitors | ||
When a chip capacitor fails in the field, the root cause is rarely a simple electrical overstress. More often, failure traces back to one of three mechanisms: dielectric breakdown accelerated by insufficient voltage margin, wire bond fatigue under thermal cycling, or physical damage during automated assembly of ultra-miniature die. The HACC101S10V500 — a 100pF ±20%, 50V DC Double-Sided Bordered Single Layer Ceramic Capacitor (SLC) — is engineered specifically to eliminate all three failure modes through conservative design margins, metallurgical optimization, and a mechanically robust double-margin architecture.
The HACC101S10V500 is fabricated with Class I COG/NPO (C0G/NP0) ultra-stable ceramic dielectric optimized for high dielectric strength. The continuous DC voltage rating is 50V, and every die undergoes 100% production testing at substantially elevated voltage to verify dielectric integrity. This conservative derating provides a minimum 2.5* safety margin — exceeding the 2* derating guideline recommended by industry reliability standards for ceramic capacitors in high-reliability applications.
For the circuit designer, this margin translates into real-world robustness: supply transients, load mismatch reflections, and DC bias shifts that might challenge a 16V or 25V-rated capacitor are absorbed with substantial headroom. In GaN power amplifier drain bias networks operating at 28-50V, the HACC101S10V500 provides reliable DC blocking and RF bypass without requiring series stacking of multiple lower-voltage capacitors — reducing component count, assembly complexity, and cumulative tolerance stack-up.
The COG/NPO dielectric also contributes to voltage stability. Unlike ferroelectric Class II dielectrics (X7R, X5R) where capacitance collapses under DC bias as barium titanate domains are clamped, COG/NPO is paraelectric — the capacitance value is stable from 0V to the full rated voltage. This means the bypass impedance you design at 0V DC bias is the same impedance your circuit sees at full operating voltage.
On a chip measuring just 0.50*0.50mm, the wire bond pad area is typically 200*200μm or smaller. At this scale, the metallurgical quality of the bond pad directly determines assembly yield. The HACC101S10V500 features a four-layer sputtered thin-film stack — TaN/TiW/Ni/Au (≥2.5μm Au minimum) — that has been refined across multiple product generations to deliver consistent, high-strength thermosonic gold wire bonds.
Here is the engineering rationale for each layer, from substrate to bond wire:
| Layer | Material | Thickness | Purpose |
|---|---|---|---|
| Foundation | TaN | Sputtered base | Tantalum Nitride forms the strongest known oxide-blocking chemical bond to ceramic dielectric. Under rapid temperature cycling (-55°C to +125°C, ΔT=180°C), this adhesion layer prevents the entire electrode stack from delaminating — a failure mode that manifests as an open circuit after thermal shock testing. |
| Diffusion Block | TiW | Sputtered barrier | Titanium-Tungsten creates a dense amorphous barrier preventing diffusion of substrate contaminants into the gold layer. Without this barrier, silicon or copper atoms would migrate into the gold over time, forming brittle intermetallic compounds at the bond interface. |
| Solder Shield | Ni | Sputtered sacrificial | Nickel serves as the industry-standard anti-leaching barrier. During eutectic AuSn reflow at 300-320°C, molten solder aggressively dissolves unprotected gold. The Ni layer is insoluble in both lead-free and leaded solders, completely preventing gold scavenging and preserving solder joint integrity. |
| Bond Surface | Au | ≥2.5μm | The 2.5μm minimum gold layer provides three critical functions: (1) a thick, ductile buffer that absorbs 40-100mW ultrasonic bonding energy without transmitting damaging stress to the ceramic substrate; (2) an oxidation-free surface that requires no flux or surface preparation before bonding; (3) sufficient gold volume for reliable ball-stitch and wedge-wedge thermosonic bonding. |
The same TaN/TiW/Ni/Au stack is applied symmetrically to both top and bottom electrodes, which means the bottom electrode enjoys identical protection against silver epoxy interdiffusion and solder leaching during die attach.
A distinctive feature of the HACC101S10V500 is its double-sided bordered (margin) design. Unlike single-bordered or borderless capacitors, this chip incorporates an un-metallized, exposed ceramic border on both the top and bottom surfaces. The practical benefit for assembly engineers is twofold:
Bottom Margin — Epoxy Containment: During conductive silver epoxy (H20E) die attach, the bottom ceramic border forms a physical containment ring around the gold electrode. When the pick-and-place collet presses the chip down, excess epoxy flows outward but cannot climb beyond the border margin. The result: zero instances of epoxy bridging from the bottom electrode, up the chip sidewall, to the top gold pad — a common defect mode in borderless chip capacitors that generates latent short-circuit failures.
Top Margin — Bond Zone Definition: The top ceramic border creates a clearly visible reference edge for automated wire bonders. The bonding wedge or ball capillary must land at least 25μm inside the gold electrode edge — the ceramic margin provides an unambiguous optical boundary for the machine vision system. Bonds placed too close to the electrode edge risk ceramic micro-cracking; the margin eliminates this ambiguity and enables high-speed bonding without manual inspection between parts.
This symmetrical structure also delivers an operational benefit: both faces of the chip are functionally identical, eliminating top/bottom orientation requirements during pick-and-place. In a production line running millions of placements per year, eliminating a single vision inspection step per component produces measurable throughput gains.
At 0.50*0.50*0.15mm (20*20*6 mil), the HACC101S10V500 occupies just 0.25mm² of carrier area — achieving a capacitance density enabled by the High-K ceramic formulation (K≈140 for X7R variants). This footprint represents a 4* area reduction compared to standard 30 mil SLCs and a 2* reduction versus 0402 SMD MLCCs. For high-density RF modules where every square micron counts — phased-array beamformers, multi-channel transceivers, filter banks — this density advantage translates directly to more functionality per module.
The 0.15mm (6 mil) ultra-low profile is equally significant. Standard 0402 MLCCs stand 0.50mm tall; the HACC101S10V500 is less than one-third that height. In hermetic hybrid modules with tight lid clearance, in vertically-stacked multi-chip assemblies, and in thin-form-factor consumer devices, this Z-height advantage eliminates the capacitor as the tallest component on the substrate — often enabling one full generation of thickness reduction.
Contact us for evaluation kits including 25 dice in waffle pack with lot-specific test data, S-parameter characterization files, and detailed assembly process recommendations for your specific bonding platform.
Company Details
Business Type:
Manufacturer
Year Established:
50%-60%
Total Annual:
>1000000
Employee Number:
>100
Ecer Certification:
Verified Supplier
Xi'an Hoan Microwave Co., Ltd. was established in 2005. The company is located in the High-tech Zone of Xi'an. The company covers an area of 800 square meters, including 500 square meters of production area and 300 square meters of office area. It is a professional enterprise specializing in t... Xi'an Hoan Microwave Co., Ltd. was established in 2005. The company is located in the High-tech Zone of Xi'an. The company covers an area of 800 square meters, including 500 square meters of production area and 300 square meters of office area. It is a professional enterprise specializing in t...
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