| wire_bond_pull_strength | >3.0g Au, >2.5g Al |
| Supply Ability | |
| Substrate Material | Silicon (p-type or n-type) |
| Delivery Time | 5-7 working days prototype |
| Gate Material | Polysilicon or Metal |
| Payment Terms | L/C,D/A,D/P,T/T, |
| oem_odm_capability | Full OEM/ODM from dielectric to wafer delivery |
| TCC | <30 ppm/C (NPO/COG equivalent), -55C to +125C |
| thickness_tolerance | ±2% wafer-level, ±1% within-die, ellipsometer verified |
| Brand Name | Hoan |
| Place of Origin | Shannxi,China |
| Model Number | HACC-CUSTOM-DV |
| Certification | ISO 9001:2015, RoHS, REACH |
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Product Specification
| wire_bond_pull_strength | >3.0g Au, >2.5g Al | Supply Ability | |
| Substrate Material | Silicon (p-type or n-type) | Delivery Time | 5-7 working days prototype |
| Gate Material | Polysilicon or Metal | Payment Terms | L/C,D/A,D/P,T/T, |
| oem_odm_capability | Full OEM/ODM from dielectric to wafer delivery | TCC | <30 ppm/C (NPO/COG equivalent), -55C to +125C |
| thickness_tolerance | ±2% wafer-level, ±1% within-die, ellipsometer verified | Brand Name | Hoan |
| Place of Origin | Shannxi,China | Model Number | HACC-CUSTOM-DV |
| Certification | ISO 9001:2015, RoHS, REACH | ||
| High Light | Wafer Level Single Layer Ceramic Capacitor ,Wafer Level High Capacity Capacitor ,High Capacity Capacitor Wafer Level | ||
The HACC-CUSTOM-DV extends the single-layer MOS capacitor voltage range through engineered dielectric thickness. The standard thermally grown SiO₂ dielectric (50–5000Å) supports rated voltages up to 500V. For higher voltage requirements, a stacked dielectric architecture — combining SiO₂ with stress-controlled SiN or high-k Al₂O₃ layers — achieves rated voltages up to 1000V while maintaining capacitance density. Dielectric withstanding voltage (DWV) is verified at 250–300% of rated voltage on every wafer, and time-dependent dielectric breakdown (TDDB) lifetime exceeds 10 years at maximum rated temperature. Thickness tolerance is ±2% wafer-level and ±1% within-die, verified by spectroscopic ellipsometry on every wafer.
The air-free single-layer MOS architecture eliminates the delamination and partial discharge risks associated with multi-layer ceramic capacitors (MLCCs) at high voltage gradients. Unlike MLCCs where internal electrode edges concentrate electric fields, the MOS capacitor's planar metal-insulator-semiconductor structure provides uniform field distribution across the entire capacitor area — a critical advantage for high-voltage reliability.
The HACC-CUSTOM-DV accommodates any downstream assembly flow with three delivery options, individually selectable per production lot or mixed per wafer split:
Mixed packaging — for example, 50% of a wafer as Gel-Pak and 50% as waffle pack — is supported without requalification, providing maximum flexibility for prototype-to-production transitions or multi-site assembly flows.
As with all HACC-CUSTOM products, substrate doping is a design parameter: N+ or P+ profiles with resistivity from 0.001 to 1000 Ohm·cm, optimized for the target breakdown voltage (BVdss) and series resistance trade-off. The C-V characteristic can be shaped for flat capacitance or controlled-slope varactor behavior.
| Parameter | Value |
|---|---|
| Capacitance | 5pF–10,000pF |
| Dielectric Thickness | 50–5000Å, SiO₂/SiN/Al₂O₃ |
| Voltage Rating | Up to 500V (single-layer), 1000V (stacked) |
| Dielectric Strength | 250–300% of rated, TDDB >10 years |
| Substrate Resistivity | 0.001–1000 Ω·cm, N+/P+ tailored |
| TCC | <30 ppm/°C |
| ESR | <0.1 Ω at 1 GHz |
| Top Metallization | TiW-Au, Al-metallized, AuSn pre-deposition |
| Delivery Options | Wafer-level, Gel-Pak, waffle pack |
| Operating Temperature | -55°C to +125°C |
Contact us with your voltage requirement, dielectric specifications, and delivery format preference. Extreme-voltage MOS capacitor prototypes ship in 5–7 business days.
Company Details
Business Type:
Manufacturer
Year Established:
50%-60%
Total Annual:
>1000000
Employee Number:
>100
Ecer Certification:
Verified Supplier
Xi'an Hoan Microwave Co., Ltd. was established in 2005. The company is located in the High-tech Zone of Xi'an. The company covers an area of 800 square meters, including 500 square meters of production area and 300 square meters of office area. It is a professional enterprise specializing in t... Xi'an Hoan Microwave Co., Ltd. was established in 2005. The company is located in the High-tech Zone of Xi'an. The company covers an area of 800 square meters, including 500 square meters of production area and 300 square meters of office area. It is a professional enterprise specializing in t...
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