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Shanghai Jiafurui Import and Export Co., Ltd.

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China ≥99% Molybdenum Hexafluoride MoF₆ CAS 7783-77-9, for Semiconductor Thin-Film
China ≥99% Molybdenum Hexafluoride MoF₆ CAS 7783-77-9, for Semiconductor Thin-Film

  1. China ≥99% Molybdenum Hexafluoride MoF₆ CAS 7783-77-9, for Semiconductor Thin-Film

≥99% Molybdenum Hexafluoride MoF₆ CAS 7783-77-9, for Semiconductor Thin-Film

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  1. Product Details
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Product Specification

1. Product Overview

Molybdenum Hexafluoride (MoF) is an important high-purity metal fluoride and electronic material precursor, serving as a critical chemical in advanced semiconductor manufacturing, functional thin-film materials, and molybdenum-based material preparation.

MoFfeatures relatively high volatility and favorable gas-phase transport characteristics, enabling its use as a molybdenum source precursor in chemical vapor deposition (CVD), atomic layer deposition (ALD), and advanced electronic material processes.

According to the COA provided by Changzhou Jiayuan Chemical Co., Ltd., the test results for this batch of Molybdenum Hexafluoride show MoFcontent of 99%, air impurities of 1%, with a test conclusion of Pass.

 

2. Specifications

Product Name: Molybdenum Hexafluoride

English Name: Molybdenum Hexafluoride

Abbreviation: MoF

Chemical Formula: MoF

CAS No.: 7783-77-9

Product Category: High-Purity Metal Fluoride / Electronic Material Precursor

Purity: 99%

Test Method: Gas Chromatography, Area Normalization Method

Packaging: High-Purity Cylinders

 

3. Product Quality Specifications

According to the COA test data from Changzhou Jiayuan Chemical Co., Ltd.:

 

MoFContent: 99%;

Air Content: 1%.

 

The test was performed by gas chromatography injection, with results obtained via area normalization method. The test conclusion is Pass.

 

4. Main Application Areas

Semiconductor Thin-Film Deposition

MoFcan serve as a molybdenum source precursor for molybdenum thin-film deposition processes in advanced semiconductor manufacturing.

 

Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD)

Leveraging the volatility and gas-phase reaction characteristics of MoF, it can be used in precision thin-film fabrication.

 

Molybdenum-Based Electronic Materials

Used in the manufacture of conductive thin films, electrode materials, and functional molybdenum materials.

 

Research and High-End Material Development

Used in the study of novel semiconductor materials, nanomaterials, and specialty molybdenum compounds.

 

5. Product Characteristics and Advantages

Efficient Molybdenum Element Transport Capability

As a gaseous molybdenum source, MoFis suitable for precision thin-film processes.

 

High-End Electronic Material Application Value

Primarily targeting semiconductors, advanced manufacturing, and research sectors.

 

High-Purity Fluoride Characteristics

Meets the requirements for stable supply and quality control of metal precursors.

 

6. Distinctions from Related Products

MoFvs. WF

WFis primarily used for tungsten thin-film deposition, while MoFis mainly used for molybdenum thin-film and molybdenum material preparation.

 

MoFvs. SiH

SiHis a silicon source gas, while MoFis a metal molybdenum source precursor.

 

MoFvs. Conventional Molybdenum Compounds

MoFoffers volatility and vapor deposition advantages, making it more suitable for advanced electronic manufacturing.

 

7. Russian Market Procurement Considerations

Customers typically focus on the following:

-MoFPurity;

-Air and Impurity Content;

-Cylinder Cleanliness;

-Filling Consistency and Stability;

-Batch-to-Batch Consistency;

-Technical Documentation including COA, TDS, SDS, and Shipping Documents.

The test results for this batch of product from Changzhou Jiayuan Chemical Co., Ltd. meet the requirements.

 

8. Product Supply Advantages

-High-Purity Metal Fluoride Product;

-Targets Semiconductor and Electronic Material Sectors;

-Supports High-Purity Packaging Supply;

-Suitable for Both Research and Industrial Customer Procurement;

-Provides Complete Quality Documentation.

 

9. Frequently Asked Questions (FAQ)

Q: Which industries are the primary users of Molybdenum Hexafluoride?

A: It is mainly used in semiconductor thin-film deposition, electronic materials, molybdenum-based functional materials, and research applications.

 

Q: Why is MoFsuitable for semiconductor processes?

A: MoFis volatile and can participate as a gaseous molybdenum source in CVD and ALD processes.

 

Q: What is the difference between MoFand WF?

A: WFprimarily provides tungsten element, while MoFprimarily provides molybdenum element, used for different thin-film material fabrication.

Q: What documentation is typically required for MoFprocurement?

A: COA, TDS, SDS, packaging information, and shipping documentation are typically required.

Company Details

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  • Year Established:

    03-21-2024

  • Ecer Certification:

    Verified Supplier

 Shanghai Jiafurui Import and Export Co., Ltd. headquartered in the core area of ​​Lujiazui, Pudong, Shanghai—China's economic, financial, and trade center—serves as a crucial window for the industrial chain extension and market connection of Changzhou Jiayuan Chemical Co., Ltd....  Shanghai Jiafurui Import and Export Co., Ltd. headquartered in the core area of ​​Lujiazui, Pudong, Shanghai—China's economic, financial, and trade center—serves as a crucial window for the industrial chain extension and market connection of Changzhou Jiayuan Chemical Co., Ltd....

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  • Shanghai Jiafurui Import and Export Co., Ltd.
  • Room 502, Floor 5, Building 47, No. 1391 Weiqing West Road, Jinshan District, Shanghai
  • https://www.jfr-chemical.com/

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