Payment Terms | T/T |
Supply Ability | 1pcs/month |
Delivery Time | 4weeks |
Packaging Details | foamed plastic+carton |
Product Type | Single-Crystal SiC Epitaxial Wafer (Composite Substrate) |
Wafer Size | 6 inches (150 mm) |
Substrate Type | Polycrystalline SiC Composite |
Crystal Structure | 4H-SiC or 6H-SiC Single Crystal |
Brand Name | ZMSH |
Place of Origin | China |
View Detail Information
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Product Specification
Payment Terms | T/T | Supply Ability | 1pcs/month |
Delivery Time | 4weeks | Packaging Details | foamed plastic+carton |
Product Type | Single-Crystal SiC Epitaxial Wafer (Composite Substrate) | Wafer Size | 6 inches (150 mm) |
Substrate Type | Polycrystalline SiC Composite | Crystal Structure | 4H-SiC or 6H-SiC Single Crystal |
Brand Name | ZMSH | Place of Origin | China |
High Light | 6-INCH Silicon Carbide Wafer ,Single CrystalSilicon Carbide Wafer |
The 6-inch Conductive Single-Crystal SiC on Polycrystalline SiC Composite Substrate
Abstract of the 6-inch Conductive Single-Crystal SiC on Polycrystalline SiC Composite Substrate
The 6-inch conductive single-crystal SiC on polycrystalline SiC composite substrate is a new type of semiconductor substrate structure.
Its core lies in bonding or epitaxially growing a single-crystal conductive SiC thin film onto a polycrystalline silicon carbide (SiC) substrate. This structure combines the high performance of single-crystal SiC (such as high carrier mobility and low defect density) with the low cost and large-size advantages of polycrystalline SiC substrates.
It is suitable for manufacturing high-power, high-frequency devices and is particularly competitive in cost-effective applications. Compared to traditional single-crystal SiC substrates, polycrystalline SiC substrates are prepared via sintering processes, which lowers the cost and allows for larger sizes (such as 6 inches), but their crystal quality is poorer and not suitable for high-performance devices directly.
Attribute Table, Technical Features, and Advantages of The 6-inch Conductive Single-Crystal SiC on Polycrystalline SiC Composite Substrate
Attribute Table
Item | Specification |
Product Type | Single-Crystal SiC Epitaxial Wafer (Composite Substrate) |
Wafer Size | 6 inches (150 mm) |
Substrate Type | Polycrystalline SiC Composite |
Substrate Thickness | 400–600 µm |
Substrate Resistivity | <0.02 Ω·cm (Conductive Type) |
Polycrystalline Grain Size | 50–200 µm |
Epitaxial Layer Thickness | 5–15 µm (customizable) |
Epitaxial Layer Doping Type | N-type / P-type |
Carrier Concentration (Epi) | 1×10¹⁵ – 1×10¹⁹ cm⁻³ (optional) |
Epitaxial Surface Roughness | <1 nm (AFM, 5 µm × 5 µm) |
Surface Orientation | 4° off-axis (4H-SiC) or optional |
Crystal Structure | 4H-SiC or 6H-SiC Single Crystal |
Threading Screw Dislocation Density (TSD) | <5×10⁴ cm⁻² |
Basal Plane Dislocation Density (BPD) | <5×10³ cm⁻² |
Step-Flow Morphology | Clear and Regular |
Surface Treatment | Polished (Epi-ready) |
Packaging | Single wafer container, vacuum-sealed |
Technical Features, and Advantages
High Conductivity:
Single-crystal SiC films achieve low resistivity (<10⁻³ Ω·cm) through doping (e.g., nitrogen doping for n-type), fulfilling low-loss requirements for power devices.
High Thermal Conductivity:
SiC has more than three times the thermal conductivity of silicon, enabling effective heat dissipation suitable for high-temperature environments such as EV inverters.
High-Frequency Characteristics:
The high electron mobility of single-crystal SiC supports high-frequency switching, including 5G RF devices. Cost and Structural Innovations
Cost Reduction via Polycrystalline Substrates:
Polycrystalline SiC substrates are produced by powder sintering, costing only about 1/5 to 1/3 of single-crystal substrates, and scalable to 6 inches or larger sizes.
Heterogeneous Bonding Technology:
High-temperature and high-pressure bonding processes achieve atomic-level bonding between single-crystal SiC and the polycrystalline substrate interfaces, avoiding defects common in traditional epitaxial growth.
Improved Mechanical Strength:
The high toughness of polycrystalline substrates compensates for the brittleness of single-crystal SiC, enhancing device reliability.
Physical image display
Fabrication Process of the 6-inch Conductive Single-Crystal SiC on Polycrystalline SiC Composite Substrate
Polycrystalline SiC Substrate Preparation:
Silicon carbide powder is formed into polycrystalline substrates (~6 inches) via high-temperature sintering.
Single-Crystal SiC Film Growth:
Single-crystal SiC layers are epitaxially grown on the polycrystalline substrate using chemical vapor deposition (CVD) or physical vapor transport (PVT).
Bonding Technology:
Atomic-level bonding at single-crystal and polycrystalline interfaces is achieved via metal bonding (e.g., silver paste) or direct bonding (DBE).
Annealing Treatment:
High-temperature annealing optimizes interface quality and reduces contact resistance.
Core Application Areas of the 6-inch Conductive Single-Crystal SiC on Polycrystalline SiC Composite Substrate
New Energy Vehicles
- Main Inverters: Conductive single-crystal SiC MOSFETs improve inverter efficiency (reducing losses by 5% to 10%) and reduce size and weight. - On-Board Chargers (OBC): High-frequency switching characteristics shorten charging times and support 800V high-voltage platforms.
Industrial Power Supply and Photovoltaics
- High-Frequency Inverters: Achieve higher conversion efficiency (>98%) in PV systems, reducing overall system cost.
- Smart Grids: Reduce energy losses in high-voltage direct current (HVDC) transmission modules.
Aerospace and Defense
- Radiation-Hard Devices: Single-crystal SiC’s radiation resistance suits satellite power management modules.
- Engine Sensors: High-temperature tolerance (>300°C) simplifies cooling system design.
RF and Communications
- 5G Millimeter Wave Devices: Single-crystal SiC-based GaN HEMTs provide high-frequency and high-power output.
- Satellite Communications: Polycrystalline substrates’ vibration resistance adapt to harsh space environments.
Q&A
Q:How conductive is a 6-inch conductive single-crystal SiC on a polycrystalline SiC composite substrate?
A:Source of Conductivity: The conductivity of single-crystal SiC is mainly achieved by doping with other elements (such as nitrogen or aluminum). The doping type can be n-type or p-type, resulting in different electrical conductivities and carrier concentrations.
Influence of Polycrystalline SiC: Polycrystalline SiC typically exhibits lower conductivity due to lattice defects and discontinuities affecting its conductive properties. Therefore, in a composite substrate, the polycrystalline portion may have some inhibiting effect on the overall conductivity.
Advantages of the Composite Structure: Combining conductive single-crystal SiC with polycrystalline SiC can potentially improve the overall high-temperature resistance and mechanical strength of the material, while also achieving the desired conductivity through optimized design in certain applications.
Application Potential: This composite structure is often used in high-power electronic devices and high-temperature environments because its excellent thermal and electrical conductivity make it suitable for operation under extreme conditions.
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Company Details
Business Type:
Manufacturer,Agent,Importer,Exporter,Trading Company
Year Established:
2013
Total Annual:
1000000-1500000
Ecer Certification:
Verified Supplier
SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014. We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components widely used in electronics, op... SHANGHAI FAMOUS TRADE CO.,LTD. locates in the city of Shanghai, Which is the best city of China, and our factory is founded in Wuxi city in 2014. We specialize in processing a varity of materials into wafers, substrates and custiomized optical glass parts.components widely used in electronics, op...
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