Product Specification

Ion Beam Polishing Machine
Atomic-Level Precision · Non-Contact Processing · Ultra-Smooth Surfaces

Product Overview of Ion Beam Polishing Machine
 

The CNC Ion Beam Figuring/Polishing Machine operates on the principle of ion sputtering. Under vacuum conditions, the ion source generates a plasma beam, which is accelerated into an ion beam that bombards the workpiece surface for atomic-level material removal, enabling ultra-precise fabrication of optical components.

This technology offers non-contact processing, free from mechanical stress or subsurface damage, and is ideal for high-precision optics in astronomy, aerospace, semiconductors, and scientific research.

Working Principle of Ion Beam Polishing Machine

• Ion Generation – Inert gas (e.g., argon) is introduced into the vacuum chamber and ionized by an electric discharge field.

• Ion Acceleration & Beam Formation – Ions are accelerated to hundreds or thousands of electron volts (eV) and shaped into a stable beam spot by focusing optics.

• Material Removal – The ion beam physically sputters surface atoms without chemical reactions.

• Error Measurement & Path Planning – Surface figure errors are measured via interferometry, then removal functions are used to calculate beam dwell times and generate processing paths.

• Closed-Loop Correction – Processing and measurement cycles are repeated until RMS/PV targets are achieved.

Equipment Features of Ion Beam Polishing Machine

• Non-contact processing – Capable of handling all surface shapes

• Stable removal rate – Sub-nanometer figure correction accuracy

• No subsurface damage – Preserves optical integrity

• High consistency – Minimal fluctuation across materials of varying hardness

• Low/Medium frequency correction – No mid-high frequency error generation

• Low maintenance cost – Long-term continuous operation with minimal downtime

Equipment Processing Capacity of Ion Beam Polishing Machine

Available Surfaces:

• Simple Optical Components: Plane, sphere, prism

• Complex Optical Components: Symmetric/asymmetric asphere, off-axis asphere, cylindrical surface

• Special Optical Components: Ultra-thin optics, slat optics, hemispherical optics, conformal optics, phase plates, freeform surfaces, other custom shapes

Available Materials:

• Common optical glass: Quartz, Microcrystalline, K9, etc.

• Infrared optics: Silicon, Germanium, etc.

• Metals: Aluminum, Stainless Steel, Titanium Alloy, etc.

• Crystal materials: YAG, Single-crystal Silicon Carbide, etc.

• Other hard/brittle materials: Silicon Carbide, etc.

Surface Quality / Accuracy:

• PV < 10 nm

• RMS ≤ 0.5 nm

Product Advantages of Ion Beam Polishing Machine

• Atomic-level removal precision – Enables ultra-smooth surfaces for demanding optical systems

• Versatile shape compatibility – From flat optics to complex freeforms

• Broad material adaptability – From precision crystals to hard ceramics and metals

• Large aperture capability – Processes optics up to Φ4000 mm

• Extended stable operation – Runs 3–5 weeks without vacuum chamber maintenance

Typical Models of Ion Beam Polishing Machine

• IBF350 / IBF750 / IBF1000 / IBF1600 / IBF2000 / IBF4000

• Motion Axes: 3-axis / 5-axis

• Max Workpiece Size: up to Φ4000 mm

Case 1 – Standard Flat Mirror

• Workpiece: D630 mm Quartz flat

• Result: PV 46.4 nm; RMS 4.63 nm

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Case 2 – X-ray Reflective Mirror

• Workpiece: 150 × 30 mm Silicon flat

• Result: PV 8.3 nm; RMS 0.379 nm; Slope 0.13 µrad

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Case 3 – Off-Axis Mirror

• Workpiece: D326 mm Off-axis ground mirror

• Result: PV 35.9 nm; RMS 3.9 nm

Application Fields of Ion Beam Polishing Machine

• Astronomical optics – Large telescope primary/secondary mirrors

• Space optics – Satellite remote sensing, deep-space imaging

• High-power laser systems – ICF optics, beam shaping

• Semiconductor optics – Lithography lenses & mirrors

• Scientific instrumentation – X-ray/neutron mirrors, metrology standard components

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