Product Specification

Working Principle: Magnetron Sputtering for Metals​

1.Vacuum Chamber Preparation: The chamber is evacuated to high vacuum to remove air and moisture.​
2.Substrate Pre-Treatment: Metal workpieces are cleaned via ion bombardment and heated.​
3.Sputtering Process: Argon gas is injected into the chamber; high voltage ionizes argon into plasma. Under the action of a strong magnetic field, plasma ions are accelerated to bombard the sputtering target, ejecting target atoms.​
4.Coating Deposition: Target atoms uniformly deposit on the rotating metal workpieces, forming a dense, thin coating.​
5.Cooling & Unloading: After coating, the chamber is vented; workpieces are cooled to room temperature and unloaded—ready for use or post-processing.

Core Features: Tailored for Metal Substrates​

① Superior Coating Performance on Metals​

Exceptional Adhesion: Adopts metal substrate pre-treatment to ensure coating-substrate bonding strength reaches ASTM 5B level. Even for high-hardness metals, the coating remains intact after 10,000+ times of friction testing.​

Extreme Durability: Supports deposition of wear-resistant coatings with surface hardness up to HV 4000—3x harder than traditional electroplated chromium. Metal tools coated with TiAlN can extend service life by 5–10x; auto engine parts can withstand 500°C high temperatures without coating degradation.​

Strong Corrosion Resistance: Ceramic-based coatings and nitride coatings enable metal parts to pass 2,000-hour neutral salt spray testing—ideal for marine, automotive, and outdoor metal components.​

② High Efficiency for Metal Mass Production​

Fast Deposition Rate: Equipped with high-power magnetron targets and optimized magnetic field design, deposition rate reaches 300–800 nm/min—2–4x faster than conventional PVD machines. For thin decorative coatings (50–200 nm), a single batch of metal parts can be coated in 15–30 minutes.​

High Target Utilization: Closed-field unbalanced magnetron structure increases target material utilization from 15% (traditional) to 45%, reducing raw material waste. For high-cost metal targets, this cuts annual target consumption costs by 30%.​

Large Batch Capacity: Configurable planetary workpiece racks can hold metal parts of various sizes—from small screws to large auto wheels. Single-batch capacity ranges from 100–500 pieces, meeting industrial-scale output.​

③ Wide Compatibility with Metal Materials​

Fully adapts to all common metal substrates, solving the problem of "poor coating adaptability for special metals":​

Ferrous Metals: Stainless steel, carbon steel, cast iron.​

Non-Ferrous Metals: Aluminum alloy, titanium alloy, copper alloy, magnesium alloy .​

Special Metals: Tungsten, molybdenum, nickel-based superalloys .​

④ Smart Control & Stable Operation​

Intelligent Process Management: 12-inch touchscreen HMI with 200+ customizable process recipes. Parameters like vacuum level, sputtering power, gas flow, and coating thickness are automatically controlled, reducing human error to <0.5%.​

Real-Time Quality Monitoring: Built-in film thickness sensor and vacuum leak detection system. If parameters deviate, the machine triggers an alarm and pauses operation—ensuring consistent coating quality for each batch of metal parts.​

24/7 Continuous Operation: Robust vacuum system and wear-resistant target holders enable stable operation for 3,000+ hours without major maintenance—matching the high-load production rhythm of metal factories.​

⑤ Eco-Friendly & Compliance​

Zero Pollution: Pure physical deposition process—no cyanide, heavy metals, or volatile organic compounds (VOCs) emitted. Complies with EU RoHS, REACH, and Chinese GB 21900 environmental standards, helping metal enterprises avoid environmental penalties.​

Energy-Saving Design: Adopts DC pulse sputtering technology and heat recovery system, energy consumption is 40% lower than electroplating machines and 25% lower than thermal evaporation PVD machines. For a 2-shift daily operation, it saves ~300 kWh of electricity monthly.