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{"title":"Jewelry Watches Accessories Vacuum Magnetron Sputtering Plating Pvd Sputtering","imgUrl":"https:\/\/img.chinax.com\/nimg\/42\/bd\/df4c6cbe90717807028e5f869662-200x200-1\/jewelry_watches_accessories_vacuum_magnetron_sputtering_plating_pvd_sputtering_machine_stainless_steel_pvd_machine.jpg","attrs":{"Place of Origin":"Guangdong","Brand Name":"Lion King","Certification":"CE","Minimum Order Quantity":"1"}}
{"title":"PVD Sputtering Ion Coating Machine\/ Multi-arc Ion Magnetron Sputtering PVD","imgUrl":"https:\/\/img.chinax.com\/nimg\/5d\/82\/40511d6873e59d14d6730b70a939-200x200-1\/pvd_sputtering_ion_coating_machine_2f_multi_arc_ion_magnetron_sputtering_pvd_coater_glass_jewel.jpg","attrs":{"Brand Name":"Lion King","Certification":"CE","Place of Origin":"Guangdong","Minimum Order Quantity":"1"}}
{"title":"high-end large-scale anti-fingerprint coating equipment designed for bathrooms","imgUrl":"https:\/\/img.chinax.com\/nimg\/29\/1f\/9baa4105844cc839a554d212a6ce-200x200-1\/high_end_large_scale_anti_fingerprint_coating_equipment_designed_for_bathrooms_with_arc_ion_coating_system_pvd_coating_machine.jpg","attrs":{"Brand Name":"Lion King","Certification":"CE","Place of Origin":"Guangdong","Minimum Order Quantity":"1"}}
{"title":"Vacuum magnetron sputtering coating equipment for coating Electronic product and","imgUrl":"https:\/\/img.chinax.com\/nimg\/16\/4a\/824cd9046365cd14615d4159b64f-200x200-1\/vacuum_magnetron_sputtering_coating_equipment_for_coating_electronic_product_and_hardware_pvd_coating_machine.jpg","attrs":{"Brand Name":"Lion King","Certification":"CE","Place of Origin":"Guangdong","Minimum Order Quantity":"1"}}
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Establishment of Vacuum Environment: A vacuum pump set is used to reduce the pressure inside the coating chamber to a high vacuum state (usually ≤10⁻³Pa), preventing air molecules from interfering with film deposition.
Plasma Excitation: An inert gas (such as argon) is introduced into the chamber, and a high-voltage electric field is applied between the target (coating material, e.g., aluminum, titanium, ITO) and the substrate to ionize the argon gas and generate plasma.
Magnetron Sputtering Deposition: A magnetic field is used to constrain the electron movement trajectory, enhancing the collision efficiency between electrons and argon molecules. This causes argon ions to bombard the target surface at high speed; the target atoms are "sputtered out", move in a straight line, and deposit on the substrate surface to form a uniform film.
2. Core Advantages
High Film Quality: The film has good uniformity (deviation can be controlled within ±5%) and strong adhesion to the substrate, making it less likely to peel off or crack.
High Coating Efficiency: The design of using a magnetic field to constrain electrons significantly improves the sputtering rate. The single-target deposition rate can reach 0.1-10μm/min, suitable for mass production.
Wide Material Adaptability: The applicable coating materials include metals (aluminum, copper, silver), alloys (stainless steel, titanium alloy), and compounds (ITO, SiO₂, Al₂O₃), meeting different functional requirements.
Environmental Friendliness and No Pollution: The entire process has no discharge of chemical waste liquid or harmful gases, and only uses inert gases and solid targets, complying with modern industrial environmental protection standards.
3. Main Application Fields
Application Industry
Examples of Specific Uses
Core Requirements
Electronic Information Industry
Chip electrode coating, display ITO conductive film, magnetic head film
High conductivity, film uniformity, precise control
Optical Field
Anti-reflection film for eyeglasses, filter film for camera lenses, laser lenses
Low reflectivity, high light transmittance, wear resistance
Decorative and Functional Coating
Decorative films for hardware (e.g., titanium gold, zirconium gold), wear-resistant films for cutting tools
Aesthetics, corrosion resistance, high hardness
New Energy Industry
Lithium battery pole piece coating, anti-reflection film for photovoltaic glass
High adhesion, mass production efficiency, low cost
4. Key Technical Parameters (Reference)
Vacuum Degree: Ultimate vacuum ≤5*10⁻⁵Pa, working vacuum 1*10⁻³ - 5*10⁻¹Pa
Target Configuration: Single-target, double-target, or multi-target (supporting DC, RF, and mid-frequency sputtering), target size Φ50-300mm
Deposition Rate: 0.5-10μm/min for metal films, 0.1-2μm/min for oxide films
Substrate Heating Temperature: Room temperature - 500℃ (precise temperature control available, temperature difference ±2℃)
Company Details
Bronze Gleitlager
,
Bronze Sleeve Bushings
and
Graphite Plugged Bushings
from Quality China Factory
Business Type:
Manufacturer
Year Established:
2003
Total Annual:
1 million US dollars-2 million US dollars
Employee Number:
80people~100 people
Ecer Certification:
Verified Supplier
Global Supplier of Next-Generation PVD Vacuum Coating Solutions
Founded in 2003, Guangdong Zhongda Vacuum Equipment Co., Ltd is a leading mechanical engineering and technology provider specializing in various type of vacuum PVD coating systems such as UV metallizer, sputtering coating machine,... Global Supplier of Next-Generation PVD Vacuum Coating Solutions
Founded in 2003, Guangdong Zhongda Vacuum Equipment Co., Ltd is a leading mechanical engineering and technology provider specializing in various type of vacuum PVD coating systems such as UV metallizer, sputtering coating machine,...