PVD Magnetron Sputtering Vacuum Coating Equipment Tools Hard Coating Machine

Product Specification

1. Core Functions

1. Diverse Coating Materials: It can prepare mainstream hard coatings such as TiN (titanium nitride), TiAlN (titanium aluminum nitride), CrN (chromium nitride), and DLC (diamond-like carbon), meeting performance requirements of different scenarios.
2. Precise Performance Control: It can adjust key indicators including coating thickness (usually 1-10μm) and hardness (up to 2000-4000HV), ensuring the coating bonds firmly with the substrate and is not easy to peel off.
3. Compatibility with Mass Production & Customization: It supports mass production (e.g., batch coating of cutting tools and molds) and can also customize special coating formulas according to needs, adapting to different substrates (such as high-speed steel, cemented carbide, and ceramics).

2. Application Fields

• Cutting Tool Industry: Coating milling cutters, drills, taps, and other cutting tools with hard coatings to extend their service life (usually by 2-5 times) and reduce cutting resistance.
• Mold Industry: Coating stamping molds, injection molds, and die-casting molds with wear-resistant and corrosion-resistant coatings to reduce mold wear and improve product forming accuracy.
• Automotive Industry: Coating engine valves, piston rings, and transmission components with wear-resistant coatings to enhance the components' resistance to high/low temperatures and impact.
• Precision Components: Coating precision parts such as bearings, gears, and medical devices (e.g., surgical instruments) with low-friction and high-hardness coatings to improve operational reliability.

3. Core Technical Advantages

1. Superior Coating Performance: Coatings prepared by magnetron sputtering technology have high uniformity (thickness deviation ≤5%), contain no heavy metals, and feature good compactness, along with stronger corrosion resistance and high-temperature oxidation resistance.
2. Higher Production Efficiency: Adopting a multi-target design (capable of installing 2-6 magnetron targets simultaneously), it supports the preparation of multi-coating stacks, with larger processing capacity per batch, making it suitable for industrial continuous production.
3. Environmental Protection & Safety: The entire process is carried out in a vacuum environment, with no waste liquid or exhaust gas emissions, complying with modern industrial environmental protection standards. Additionally, the coating process operates at low temperatures (usually 150-400℃), avoiding substrate deformation caused by high temperatures.

4. Composition of Core Components

1. Vacuum System: Composed of molecular pumps, mechanical pumps, and vacuum valves, it ensures the vacuum degree in the coating chamber reaches 10⁻³-10⁻⁵Pa, providing a clean environment for sputtering.
2. Magnetron Target System: Configured with corresponding metal targets (e.g., Ti targets, Cr targets) according to coating materials, it restricts plasma through magnetic fields to improve sputtering efficiency and coating quality.
3. Substrate Clamping & Heating System: It supports substrate fixing (e.g., turrets, fixtures) and can precisely control the substrate temperature (room temperature - 500℃) to optimize coating adhesion.
4. Control System: Adopting PLC or touchscreen control, it allows presetting of coating process parameters (such as sputtering power, time, and argon flow), enabling automated production and reducing the difficulty of manual operation.